Particle adhesion and removal in electrophotography
Source abstract
Abstract
Abstract Particle adhesion and removal is often controlled by the interplay of electrostatic forces, related to electrical charges on the particles, and electrodynamic forces, such as those arising from van der Waals interactions. In addition, when electrostatically detaching a charged particle from a substrate, the manner in which the electric field is applied can alter the charge on the particle, thus changing both the attractive and detachment forces. The effects are clearly illustrated in the transfer of a toned image from the photoconductor in an electrophotographic engine. This paper reviews present day understanding of the interplay between electrostatic and electrodynamic interactions, as they occur within the electrophotographic process, and presents the results of previous studies in a unified manner. Keywords: TONERELECTROPHOTOGRAPHYTRANSFERADHESIONELECTROSTATIC FORCESVAN DER WAALS FORCES
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Near-Field Optical Microscopy · Force Microscopy Techniques and Applications · Surface Roughness and Optical Measurements
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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