journal article·2004-01

A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography

Wei Shen, Brenda Hutton, Fuping Liu

Publisher page

Abstract

In conventional offset lithographic printing, it has been well established that the existence of a continuous layer of fountain solution (FS) on the surface of the non-image area is an essential condition to ensure correct operation of lithography. However, the mechanistic function of FS in preventing the ink from being transferred onto the non-image area has not been fully understood. Several major mechanistic interpretations can be found in the literature, which are based either on comparing of static works of adhesion and cohesion of ink and FS, or on the splitting of the 'weaker' FS layer. Although the latter becomes more accepted, direct experimental evidence is difficult to find in the literature. On the other hand, confusing information found in the literature showed that the ink-transfer (or non-transfer) observations reported in many case studies correlate well with simple comparisons of works of adhesion, cohesion and spreading data of ink/FS, ink/plate and FS/plate obtained under the static condition. These results, therefore, imply that, in explaining the function of FS in preventing ink transfer to the non-image area, the ink/FS interfacial adhesion failure would be the dominant mechanism. The work presented in this study covered two specific areas in order to address and better understand the responses of ink and FS layers and their interface to forces encountered during ink transfer. Firstly, an analysis of lithographic plates contaminated with a cationic polymer revealed that the violation of the ink non-transfer condition of the plate non-image area due to contamination could be predicted by traditional criteria of plate wetting and works of adhesion and cohesion. However, these traditional criteria cannot reliably predict the non-transfer condition of the ink on the clean non-image area that was covered by FS. Secondly, in some novel experiments conducted in this study using ice or Teflon as a substrate, the works of adhesion and cohesion were not able to predict ink transfer in most cases. Direct experimental evidence from this work revealed that splitting of the FS layer was involved in the prevention of ink transfer to the non-image areas, and that the thickness of the FS layer was critical in allowing the splitting to occur.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Material Properties and Processing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (39)

Show source-provided references
1. Wilkinson, M. C., Aronson, M. P., Vanderhoff, J. W. and Zettlemoyer, A. C. 1975.Adhesion Sci. Technol. Part B, Edited by: Lee, L. H. 725–734. New York, NY: Plenum Press.10.1007/978-1-4613-4331-8_20 ↗
2. Leach, R. H., Pierce, R. J., Hickman, E. P., Mackenzie, M. J. and Smith, H. G., eds. 1993.The Printing Ink Manual, 5th edn, 342–452. London: Chapman & Hall.10.1007/978-1-4020-6187-5 ↗
3. Vanderhoff J. W. · Am. Ink Maker · 1973 · 51 · 25
4. De Grace J. H. · Adv. Printing Sci. Technol. · 1984 · 17 · 312
5. Eriksson J. C. · Acta Chem. Scand. · 1962 · 16 · 219910.3891/acta.chem.scand.16-2199 ↗
6. Kaelble, D. H., Dynes, P. J. and Pav, D. 1975.Adhesion Sci. Technol. Part B, Edited by: Lee, L. H. 735–761. New York, NY: Plenum Press.10.1007/978-1-4613-4331-8_21 ↗
7. MacPhee, J. 1979.Technical Association of the Graphic Arts (TAGA) Proceedings237–277.
8. Lindqvist U. · Adv. Printing Sci. Technol. · 1982 · 16 · 67
9. Trollsas P. O. · Tappi J. · 1995 · 78 · 155
10. Riddell G. L. · J. Phys. Chem. · 1931 · 35 · 272210.1021/j150327a020 ↗
11. Tritton F. J. · J. Soc. Chem. Ind. · 1932 · 51 · 29910.1002/jctb.5000511405 ↗
12. Kato Y. · Ind. Eng. Chem. Prod. Res. Dev. · 1982 · 21 · 44110.1021/i300007a018 ↗
13. Bassemir, R. W. and Shubert, F. G. 1984.Technical Association of the Graphic Arts (TAGA) Proceedings555–567.
14. Bassemir, R. W. and Shubert, F. G. 1982.Technical Association of the Graphic Arts (TAGA) Proceedings290–310.
15. Ottinen, P. and Saarelma, H., eds. 2000.Printing, 132–168. Helsinki: Fapet Oy. Chap. 5
16. Shaw, D. J. 1992.Introduction to Colloid and Surface Chemistry, 4th edn, 66London: Butterworth-Heinemann.
17. Wu, S. 1982.Polymer Interface and Adhesion, 98New York, NY: Marcel Dekker.
18. Berg, J. C. 1993.Wettability, Edited by: Berg, J. C. 75–148. New York, NY: Marcel Dekker.10.1201/9781482277500 ↗
19. Owens D. K. · J. Appl. Polym. Sci. · 1969 · 13 · 174110.1002/app.1969.070130815 ↗
20. Adamson, A. W. and Gast, A. P. 1997.Physical Chemistry of Surfaces, 6th edn, 225–256. New York, NY: Wiley-Interscience. Chapter VI
21. Good, R. J. 1967.Treatise on Adhesion and Adheives, Edited by: Patrick, R. L. Vol. 1, 9–68. New York, NY: Marcel Dekker.
22. Fowkes F. M. · Ind. Eng. Chem. Prod. Res. Dev. · 1964 · 56 · 4010.1021/ie50660a008 ↗
23. Huntsberger, J. R. 1967.Treatise on Adhesion and Adheives, Edited by: Patrick, R. L. Vol. 1, 119–149. New York, NY: Marcel Dekker.
24. Adamson A. W. · 1997
25. Zhmud B. · 2003
26. Beamson, G. and Briggs, D. 1992.High Resolution XPS of Organic Polymers, 182–183. Chichester: John Wiley.
27. Adamson A. W. · J. Colloid Interface Sci. · 1970 · 34 · 46110.1016/0021-9797(70)90206-7 ↗
28. Wu, S. 1982.Polymer Interface and Adhesion, 339New York, NY: Marcel Dekker.
29. Aspler, J. S., Zang, Y.H., Larrondo, L. and Perron, L. 1997.Technical Association of the Graphic Arts (TAGA) Proceedings162–178.
30. McGill W. J. · Trans. Commun. Oil and Colour Chemists’ Ass. J. · 1977 · 60 · 121
31. Faraday, M. 1860. “Proc. Roy. Soc”. Vol. 10, 440–450. London10.1098/rspl.1859.0082 ↗
32. Beaglehole D. · Surf. Sci. · 1980 · 96 · 35710.1016/0039-6028(80)90313-1 ↗
33. Fletcher N. H. · Philos. Mag. · 1992 · 66 · 10910.1080/13642819208221298 ↗
34. Gilpin R. R. · J. Colloid Interf. Sci. · 1979 · 68 · 23510.1016/0021-9797(79)90277-7 ↗
35. Romkens M. J. M. · J. Colloid Interf. Sci. · 1973 · 42 · 10310.1016/0021-9797(73)90012-X ↗
36. Ketcham W. M. · Philos. Mag. · 1969 · 19 · 116110.1080/14786436908228641 ↗
37. Knight C. A. · J. Colloid Interf. Sci. · 1967 · 25 · 28010.1016/0021-9797(67)90031-8 ↗
38. van Oss, C. J., Giese, R. F., Wentzek, R., Norris, J. and Chuvilin, E. M. 1993.Contact Angle, Wettability and Adhesion, Edited by: Mittal, K. L. 677–690. Utrecht: VSP.
39. Kloubek J. · J. Colloid Interf. Sci. · 1974 · 46 · 18510.1016/0021-9797(74)90001-0 ↗