Fabrication and characterization of Ge_20As_20Se_15Te_45 chalcogenide glass for photonic crystal by nanoimprint lithography

Ge20As20Se15Te45 chalcogenide glass was fabricated and systematically studied. This glass exhibits broad transmission range, high linear and non-linear refractive index, and good thermal stability. The low glass transition temperature allowed for the thermal nanoimprint to be accomplished directly on the bulk Ge20As20Se15Te45 glass to produce photonic crystals with a hybrid soft stamp. By optimizing the imprint conditions, uniform gratings with 500 nm depth grooves were fabricated by direct resist-free thermal nanoimprint lithography.