Fabrication of a rutile titanium dioxide thin film heterostructure using ion-implantation with Cu-Sn bonding
Source abstract
Abstract
Single crystalline titanium dioxide thin film in the rutile phase (r-TiO2) is exfoliated from bulk material using a He+-implantation method, and is bonded onto SiO2 substrate to form a heterostructure using Cu-Sn bonding technology. The exfoliated r-TiO2 thin film was examined to be in good quality, and the exfoliation mechanism of ion-implanted r-TiO2 was analyzed. The obtained r-TiO2 thin film heterostructure with high refractive index contrast has a potential application in the fabrication of high-Q optical microcavities in visible wavelengths, which is useful in integrated photonic devices.
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Research context
OpenAlex topics: Optical Coatings and Gratings · Semiconductor Lasers and Optical Devices · Photonic and Optical Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Shenzhen Technology University
Shandong University
Shenzhen University
Funding
National Natural Science Foundation of China · Natural Science Foundation of Guangdong Province · Guangdong Province for Science and Technology Innovative Young Talents · Science and Technology Planning Project of Shenzhen Municipality · Post-doctoral research project of SZTU · State Key Laboratory of Nuclear Physics and Technology, Peking University
References (37)
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