journal article·2022-01-01Open access

Structural and emission improvement of cyan-emitting InGaN quantum wells by introducing a large substrate misorientation angle

A. Kafar, A. Sakaki, R. Ishii, K. Shojiki, S. Stanczyk, K. Gibasiewicz, G. Staszczak, L. Marona, D. Schiavon, S. Grzanka, S. Krukowski, T. Suski, P. Perlin, M. Funato, Y. Kawakami

Optical Materials Express· Volume 12· Issue 1

Abstract

Within this work, we studied InGaN QWs with nominally 17% InN mole fraction grown within an 80 × 80 μm area with local misorientation angle change from 0.3° to 3.2°. We observed a significant improvement of the photoluminescence intensity for the area with misorientation above 1.5°, which we attribute to the quenching of nonradiative recombination processes. From the structural point of view, the increase of the misorientation angle above 1.5° is accompanied by the improvement of the morphology of the sample and quality of the quantum wells observed through atomic force microscopy and transmission electron microscopy. We show that the structural and emission qualities in high-InN- mole fraction layers can be improved just by increasing the misorientation angle of the substrate and that the improved qualities are preserved even for large misorientation angles.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Metal and Thin Film Mechanics · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Kyoto University

Institute of High Pressure Physics PAS

Nichia Corporation

Mie University

TopGaN Ltd.

Funding

Japan Society for the Promotion of Science · Fundacja na rzecz Nauki Polskiej

References (55)

Show source-provided references
1. Amano · Jpn. J. Appl. Phys. · 1989 · 28 · L211210.1143/JJAP.28.L2112 ↗
2. Nakamura · Jpn. J. Appl. Phys. · 1992 · 31 · L13910.1143/JJAP.31.L139 ↗
3. Nakamura · Jpn. J. Appl. Phys. · 1996 · 35 · L7410.1143/JJAP.35.L74 ↗
4. Narukawa · Jpn. J. Appl. Phys. · 2006 · 45 · L108410.1143/JJAP.45.L1084 ↗
5. Gardner · Appl. Phys. Lett. · 2007 · 91 · 24350610.1063/1.2807272 ↗
6. Laubsch · IEEE Trans. Electron Devices · 2010 · 57 · 7910.1109/TED.2009.2035538 ↗
7. Hirayama · Jpn. J. Appl. Phys. · 2014 · 53 · 10020910.7567/JJAP.53.100209 ↗
8. Islam · Appl. Phys. Lett. · 2017 · 110 · 04110810.1063/1.4975068 ↗
9. Zhang · Appl. Phys. Express · 2019 · 12 · 12400310.7567/1882-0786/ab50e0 ↗
10. Kneissl · Nat. Photonics · 2019 · 13 · 23310.1038/s41566-019-0359-9 ↗
11. Amano · J. Phys. D: Appl. Phys. · 2020 · 53 · 50300110.1088/1361-6463/aba64c ↗
12. Nakamura · Jpn. J. Appl. Phys. · 1995 · 34 · L133210.1143/JJAP.34.L1332 ↗
13. Miyoshi · Appl. Phys. Express · 2009 · 2 · 06220110.1143/APEX.2.062201 ↗
14. Jiang · Sci Rep · 2015 · 5 · 1088310.1038/srep10883 ↗
15. Lutgen · phys. stat. sol. (a) · 2010 · 207 · 131810.1002/pssa.200983620 ↗
16. Raring · Appl. Phys. Express · 2010 · 3 · 11210110.1143/APEX.3.112101 ↗
17. Saito · Appl. Phys. Express · 2013 · 6 · 11100410.7567/APEX.6.111004 ↗
18. Sekiguchi · Appl. Phys. Lett. · 2010 · 96 · 23110410.1063/1.3443734 ↗
19. Hwang · Appl. Phys. Express · 2014 · 7 · 07100310.7567/APEX.7.071003 ↗
20. Frost · Jpn. J. Appl. Phys. · 2016 · 55 · 03210110.7567/JJAP.55.032101 ↗
21. Jiang · Photon. Res. · 2019 · 7 · 14410.1364/PRJ.7.000144 ↗
22. Ozaki · Appl. Phys. Express · 2019 · 12 · 01100710.7567/1882-0786/aaf4b1 ↗
23. Dussaigne · J. Appl. Phys. · 2020 · 128 · 13570410.1063/5.0016217 ↗
24. Zhang · Photon. Res. · 2020 · 8 · 167110.1364/PRJ.402555 ↗
25. Vurgaftman · J. Appl. Phys. · 2001 · 89 · 581510.1063/1.1368156 ↗
26. Zinovchuk · Phys. B · 2019 · 574 · 41168210.1016/j.physb.2019.411682 ↗
27. Duff · Phys. Rev. B · 2014 · 89 · 08530710.1103/PhysRevB.89.085307 ↗
28. Fiorentini · Phys. Rev. B · 1999 · 60 · 884910.1103/PhysRevB.60.8849 ↗
29. Miller · Phys. Rev. Lett. · 1984 · 53 · 217310.1103/PhysRevLett.53.2173 ↗
30. Ryou · IEEE J. Select. Topics Quantum Electron. · 2009 · 15 · 108010.1109/JSTQE.2009.2014170 ↗
31. Funato · Jpn. J. Appl. Phys. · 2006 · 45 · L65910.1143/JJAP.45.L659 ↗
32. Northrup · Appl. Phys. Lett. · 2009 · 95 · 13310710.1063/1.3240401 ↗
33. Zhao · Appl. Phys. Lett. · 2012 · 100 · 20110810.1063/1.4719100 ↗
34. Durnev · Appl. Phys. Lett. · 2010 · 97 · 05190410.1063/1.3476344 ↗
35. Browne · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2012 · 30 · 04151310.1116/1.4727967 ↗
36. Sarzynski · Cryst. Res. Technol. · 2012 · 47 · 32110.1002/crat.201100491 ↗
37. Leszczynski · J. Cryst. Growth · 2011 · 318 · 49610.1016/j.jcrysgro.2010.10.050 ↗
38. Farrell · J. Cryst. Growth · 2010 · 313 · 110.1016/j.jcrysgro.2010.08.060 ↗
39. Kelchner · J. Cryst. Growth · 2013 · 382 · 8010.1016/j.jcrysgro.2013.08.013 ↗
40. Sarzyński · J. Cryst. Growth · 2015 · 423 · 2810.1016/j.jcrysgro.2015.04.024 ↗
41. Du · Mater. Sci. Semicond. Process. · 2019 · 96 · 16710.1016/j.mssp.2019.02.029 ↗
42. Keller · J. Appl. Phys. · 2008 · 104 · 09351010.1063/1.3006132 ↗
43. Kuritzky · Appl. Phys. Express · 2015 · 8 · 06100210.7567/APEX.8.061002 ↗
44. Tian · Appl. Phys. Lett. · 2017 · 111 · 11210210.1063/1.5001185 ↗
45. Liu · J. Cryst. Growth · 2019 · 508 · 5810.1016/j.jcrysgro.2018.12.028 ↗
46. Kafar · Opt. Express · 2020 · 28 · 2252410.1364/OE.394580 ↗
47. Zhao · IET Optoelectron. · 2009 · 3 · 28310.1049/iet-opt.2009.0050 ↗
48. Zhao · Opt. Express · 2011 · 19 · A99110.1364/OE.19.00A991 ↗
49. Kafar · Photon. Res. · 2021 · 9 · 29910.1364/PRJ.411701 ↗
50. Christian · Phys. Rev. B · 2018 · 98 · 15530110.1103/PhysRevB.98.155301 ↗
51. Jiang · Appl. Phys. Express · 2019 · 12 · 05550310.7567/1882-0786/ab0da2 ↗
52. Bryan · J. Cryst. Growth · 2016 · 438 · 8110.1016/j.jcrysgro.2015.12.022 ↗
53. Burton · Phil. Trans. R. Soc. Lond. A · 1951 · 243 · 29910.1098/rsta.1951.0006 ↗
54. Williams · 199610.1007/978-1-4757-2519-3 ↗
55. Dróżdż · Phys. Status Solidi A · 2017 · 214 · 160081510.1002/pssa.201600815 ↗