Two-dimensionally-patterned silicon nanocrystal arrays

Abstract Recent efforts to enhance and control the optical properties of silicon nanocrystal composites have led to the realization of planar optical cavities and optical waveguide structures. Here, we report on methods to pattern the in-plane location of the silicon nanocrystals. First, we applied conventional lithographic methods to fabricate masks sufficiently thick and durable to withstand high-dose (>1017 ions/cm2) ion implantation protocols without losing structural integrity or delaminating from the specimen surface. We used this method to create single and two-color micropixelated arrays of nanoparticles with feature sizes below one micron. Implantation of silica microspheres can also be used to create in-plane spatial control over the location of the nanocrystals, although in this case there was significant material deformation. Both methods, however, offer effective means of patterning silicon nanocrystals on a micron- to sub-micron scale, and suggest the possibility for the development of new types of patterned luminescent materials based on silicon nanocrystal composites.