New Method to Measure Tensile Strength of Low Modulus Thin Films
Source abstract
Abstract
In this study, we present a new fracture testing technique that can be used to determine the tensile strength of low strength thin films. This test utilizes standard photolithography processes to fabricate test samples and to perform the test. Finite element analysis is then used to extract tensile strength from the experimental data. This technique is demonstrated by measuring tensile strength values for parylene-C thin films. The polymer parylene-C is commonly deposited as a thin film and used in a wide range of applications, but few reports have been presented on its mechanical properties. Test samples were fabricated on glass slides with 100 nm of SiO2 and 1 μm or 3.64 μm of parylene-C. The tensile strength of parylene-C was determined to be in the range of 57 MPa by using finite element analysis to extract the tensile strength from the experimental data.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications · Advanced MEMS and NEMS Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (15)
Show source-provided references
1. Aoyagi S, Furukawa K, Ono D, Ymashita K, Tanaka T, Inoue K, Okuyama M (2008) Development of a capacitive ultrasonic sensor having parylene diaphragm and characterization of receiving performance of arrayed device. Sensors and Actuators A: Physical 145-146:94-102.10.1016/j.sna.2007.10.060 ↗
2. Bagchi A, Lucas GE, Suo Z, Evans AG (1994) New procedure for measuring the decohesion energy for thin ductile film on substrates. Journal of Materials Research 9(7): 1734–174110.1557/JMR.1994.1734 ↗
3. Carlotti G, Doucet L, Dupeux M (1997) Elastic properties of silicon dioxide films deposited by chemical vapour deposition from tetraethylorthosilicate. Thin Solid Films 296(1-2): 102–10510.1016/S0040-6090(96)09346-7 ↗
4. Grachev SY, Tichelaar FD, Janssen G CAM (2005) Stress in sputter-deposited Cr films: Influence of Ar pressure. Journal of Applied Physics 97(7): 1–410.1063/1.1876579 ↗
5. Guilbaud-Massereau V, Celerier A, Machet J (1995) Study and improvement of the adhesion of chromium thin films deposited by magnetron sputtering. Thin Solid Films 258(1-2): 185–19310.1016/0040-6090(94)06360-5 ↗
6. Hoffman DW, Thornton JA (1981) Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source. Journal of vacuum science & technology 20(3): 355–35810.1116/1.571463 ↗
7. Huang X, Li S, Schultz JS, Wang Q, Lin Q (2009) A MEMS affinity glucose sensor using a biocompatible glucoseresponsive polymer. Sensors and Actuators B: Chemical 140(2): 603–60910.1016/j.snb.2009.04.065 ↗
8. Ke L, Kumar RS, Zhang K, Chua S-J, Wee ATS (2004) Effect of parylene layer on the performance of OLED. Microelectronics Journal 35(4): 325–32810.1016/S0026-2692(03)00238-6 ↗
9. Ohring M (2002) science of thin films: deposition and structure (Second Edition). Academic Press, San Diego
10. Podzorov V, Pudalov VM, Gershenson ME (2003) Field-effect transistors on rubrene single crystals with parylene gate insulator. Applied Physics Letters 82(11): 1739–1741 {2}10.1063/1.1560869 ↗
11. Shih CY, Harder TA, Tai YC (2004) Yield strength of thin-film parylene-C. Microsystem Technologies 10(5): 407–41110.1007/BF02637112 ↗
12. Targove JD, Macleod HA (1988) Verification of momentum transfer as the dominant densifying mechanism in ion-assisted deposition. Appl Opt. 27(18): 3779–378110.1364/AO.27.003779 ↗
13. Windischmann H. (1992) Intrinsic stress in sputter-deposited thin films. Critical Reviews in Solid State and Materials Sciences 17(6): 547–59610.1080/10408439208244586 ↗
14. Zheng J, Sitaraman SK (2007) Fixtureless superlayer-driven delamination test for nanoscale thin-film interfaces. Thin Solid Films 515(11): 4709–471610.1016/j.tsf.2006.11.065 ↗
15. Zopfl T, Klare S, Wachutka G, Schrag G (2009) Characterization of the intrinsic stress in micromachined parylene membranes. Proceedings SPIE 7362. doi: 10.1117/12.821797 .10.1117/12.821797 ↗