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Source abstract
Abstract
Cover Photograph: Top) Optimization of the electric heatings for the annealing lehr's zones bottom left and bottom right; (Bottom left) Original and optimized temperature distribution in the UTG ribbon's side at 400 mm to the edge; (Bottom right) Original and optimized residual stresses calculated from FEM and measured via VI at different distances to the UTG ribbon edge. Residual stress seriously affects the quality of ultra-thin glass (UTG); therefore, it is of great scientific interest and technological significance to precisely regulate the annealing process for controlling residual stress. In the past, many studies point out that the residual stress formation process is the comprehensive result of the stress accumulation and release of viscoelastic in the macro. However, we consider that it is caused by the glass atoms structure relaxation process in the micro based on our molecular dynamics (MD) calculation results. The precise regulation of UTG residual stress is realized by revealing the relationship between residual stress with annealing temperature schedule from the micro-scale and combining it with the relevant measurement and calculation means.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Laser Material Processing Techniques · Semiconductor Lasers and Optical Devices
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