Preparation and characterization of multilayer Gd2O2S:Tb phosphor screen for X‐ray detection application

Abstract Gd2O2S:Tb (GOS) phosphor screen, generally with a multilayer structure, has been widely used in digital X‐ray imaging. GOS phosphor screen is fabricated via a slip casting route, which is an effective method to obtain multilayer composites with good strength. The GOS slurry was prepared using the menhaden oil, polyvinyl butyral and PEG‐400 as dispersant, binder and plasticizer, respectively, and slip casted on a support layer. After the GOS scintillation layer is formed, a transparent polyethylene terephthalate film is covered on it as a protective layer. The X‐ray excited emission spectra of the obtained GOS phosphor screen is well match to the spectral response of a‐Si:H photodiode, and the spatial resolution was close to 3.7 LP/mm, which could meet the request of the commercial application.