journal article·2005-03

Radiation-induced absorption in high-purity silica fiber preforms

M. O. Zabezhailov, A. L. Tomashuk, I. V. Nikolin, V. G. Plotnichenko

Inorganic Materials· Volume 41· Issue 3
Publisher page

Abstract

The effect of the preform fabrication procedure on the radiation-induced absorption in KU-1 and KS-4V high-purity silica glasses was investigated (these glasses are used in fiber preform fabrication via outside fluorosilicate glass deposition on substrate rods and in the rod-in-tube process). The results demonstrate that the deposition of a reflective cladding onto KU-1 rods drastically increases the radiation-induced UV absorption of the rods. In particular, the concentrations of radiation-induced nonbridging oxygen hole centers and E′ centers in gamma-irradiated KU-1 rods with a fluorosilicate cladding are an order of magnitude higher than those in rods that were not heat-treated in plasma torch flames. At the same time, the deposition of a reflective cladding on KS-4V rods has little effect on the concentrations of these radiation-induced color centers. The radiation-induced absorption in KU-1 rods depends on the deposition temperature and duration but is insensitive to the composition of the gas mixture in the torch (in particular, to the presence of fluorination agents) and the presence of a fluorosilicate cladding. It is shown that, in preforms fabricated by the rod-in-tube process, the net concentration of radiation-induced color centers in the substrate rod is lower compared to the outside plasma deposition of fluorosilicate glass on the rod.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Glass properties and applications · Luminescence Properties of Advanced Materials · Building materials and conservation

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (21)

Show source-provided references
1. Tomashuk, A.L and Golant, K.M, Radiation-Resistant and Radiation-Sensitive Silica Optical Fibers, Proc. SPIE-Int. Soc. Opt. Eng., 2000, vol. 4083, pp. 188–201.
2. Amossov, A.V. and Rybaltovsky, A.O., Radiation Color Center Formation in Silica Glasses: A Review of Photo-and Thermochemical Aspects of the Problem, J. Non-Cryst. Solids, 1994, vol. 179, pp. 226–234.10.1016/0022-3093(94)90700-5 ↗
3. Hitzler, H., Pfleiderer, Ch., Leclerc, N., et al., KrF-Laser Irradiation Induced Defects in All Silica Optical Fibers, J. Non-Cryst. Solids, 1992, vol. 149, pp. 107–114.10.1016/0022-3093(92)90059-S ↗
4. Prochorov, A.M, Kuz’min, G.P, Kisletsov, A.V, et al., Ultraviolet Laser Al’Mitsin-2 in Treatment of Fiber-Cavernous Lung Tuberculosis, Proc. SPIE-Int. Soc. Opt. Eng., 1999, vol. 3829, pp. 18–28.
5. Klein, K.F., Schliebmann, P., Smolka, E., et al., UV-Stabilized Silica-Based Fibre for Applications around 200 nm Wavelength, Sens. Actuators, B, 1997, vol. 38/39, pp. 35–39.
6. Biriukov, A.S., Dianov, E.M., Golant, K.M., et al., Synthesis of Fluorine-Doped Silica Glass by Means of an Outside Deposition Technique Using a Microwave Plasma Torch, Sov. Lightwave Commun., 1993, vol. 3, pp. 1–12.
7. Kanan, S., Li, J., Lehman, L., and Sigel, G.H., Jr., Excimer-Laser-Induced Spatially Variant Luminescence in Pure-Silica Core Fibers with Fluorine-Doped Silica Cladding, Appl. Opt., 1993, vol. 32, no.33, pp. 6684–6689.10.1364/AO.32.006684 ↗
8. Nagasawa, K., Tohmon, R., and Ohki, Y., Effect of Cladding Material on 2-eV Optical Absorption in Pure-Silica Core Fibers and Method to Suppress the Absorption, Jpn. J. Appl. Phys., 1987, vol. 26, pp. 148–151.10.1143/JJAP.26.148 ↗
9. Deparis, O., Griscom, D.L., Megret, P., et al., Influence of the Cladding Thickness on the Evolution of the NBOHC Band in Optical Fibers Exposed To Gamma Radiations, J. Non-Cryst. Solids, 1997, vol. 216, pp. 124–128.10.1016/S0022-3093(97)00123-3 ↗
10. Zabezhailov, M.O., Tomashuk, A.L., Nikolin, I.V., and Golant, K.M., The Role of Fluorine-Doped Cladding in Radiation-Induced Absorption, IEEE Trans. Nucl. Sci., 2002, vol. 49, no.3, pp. 1410–1413.10.1109/TNS.2002.1039675 ↗
11. Munekuni, S., Yamanaka, T., Shimogaichi, Y., et al., Various Types of Nonbridging Oxygen Hole Center in High-Purity Silica Glass, J. Appl. Phys., 1990, vol. 68, no.3, pp. 1212–1217.10.1063/1.346719 ↗
12. Griscom, D.L., Radiation Hardening of Pure-Silica-Core Optical Fibers by Ultra-High-Dose γ-ray Pre-irradiation, J. Appl. Phys., 1995, vol. 77, pp. 5008–5013.10.1063/1.359310 ↗
13. Dianov, E.M., Karpechev, V.N., Karpychev, N.S., et al., Effect of Process Parameters on the Formation of Radiation-Induced Color Centers in Optical Fibers, Fiz. Khim. Stekla, 1986, vol. 12, no.5, pp. 555–561.
14. Abramov, A.V., Boganov, A.G., Kornienko, L.S., et al., Radiation-Induced Color Centers in KS-4V Glass and Optical Fibers, Fiz. Khim. Stekla, 1988, vol. 14, no.1, pp. 91–96.
15. Amosov, A.V., A New View of the Formation Mechanism for Radiation-Induced Paramagnetic Color Centers in Silica Glass, Fiz. Khim. Stekla, 1983, vol. 9, no.5, pp. 569–583.
16. Skuja, L., Optical Properties of Defects in Silica, Proc. NATO Advanced Study Institute on Defects in SiO 2 and Related Dielectrics: Science and Technology, Erice, 2000, pp. 73–116.10.1007/978-94-010-0944-7_3 ↗
17. Skuja, L., Optically Active Oxygen-Deficiency-Related Centers in Amorphous Silicon Dioxide, J. Non-Cryst. Solids, 1998, vol. 239, pp. 16–48.10.1016/S0022-3093(98)00720-0 ↗
18. Cheremisin, I.I., Ermolenko, T.A., Evlampiev, I.K., et al., Radiation-Hard KS-4V Glass and Optical Fiber, Manufactured on Its Basis, for Plasma Diagnostics in ITER, Plasma Devices Operations, 2004, vol. 12, no.1, pp. 1–9.10.1080/10519990410001652593 ↗
19. Lunin, B.S. and Torbin, S.N., Temperature-Dependent Young’s Modulus of Pure Silica Glasses, Vestn. Mosk. Univ., Ser. 2: Khim., 2000, vol. 41, no.3, pp. 172–173.
20. Bakos, T., Rashkeev, S.N., and Pantelides, S.T., Reactions and Diffusion of Water and Oxygen Molecules in Amorphous SiO2, Phys. Rev. Lett., 2002, vol. 88, no.5, pp. 055508-1–055508-4.10.1103/PhysRevLett.88.055508 ↗
21. Munekuni, S., Dohguchi, N., Nishikawa, H., et al., Si-O-Si Strained Bond and Paramagnetic Defect Centers Induced by Mechanical Fracturing in Amorphous SiO2, J. Appl. Phys., 1991, vol. 70, no.9, pp. 5054–5062.10.1063/1.349012 ↗