Structure and lubricated tribological behavior of silicon incorporated carbon nitride composite films deposited by magnetron sputtering
Source abstract
Abstract
Abstract Silicon incorporated C N films were prepared by ion beam assisted magnetron sputtering using silicon/graphite composite target. The microstructure of the Si C N films was characterized by SEM, XPS, TEM and Raman spectroscopy. Mechanical and lubricated tribological behavior of the films were investigated by the nano-indentation experiments and ball-on-disc tribotest in Hank's solution. With the increase of silicon target fraction (FT-Si), the silicon content steadily increased from 1.8 to 15.8 at.% with a simultaneous decrease in the C content from 78 at.% to 56 at.%. The N content slightly decreased from 25.2 at.% to 19.8 at.%, and silicon and N content is saturated as the FT-Si reaches about 50 at.%. The hardness and elastic modulus increased with the FT-Si, while the average friction coefficient decreased with the FT-Si increase. The C N films deposited at a FT-Si of 10 vol% show the lowest coefficient of friction of 0.049, and exhibited good mechanical and lubricated tribological properties.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Boron and Carbon Nanomaterials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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