A comparison of the corrosion protection of copper by ion implantation of Al and Cr
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Abstract
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Copper Interconnects and Reliability · Corrosion Behavior and Inhibition
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References (9)
Show source-provided references
1. J. Rickards and G. Dearnaley, Ion implantation and backscattering from oxidized single crystals. Proc. 13th. App. of Ion Beams to Metals.
2. Naguib · J. Vac. Sci. Technol. · 1976 · 13 · 39610.1116/1.568928 ↗
3. Schiott · Rad. Eff. · 1970 · 6 · 10710.1080/00337577008235052 ↗
4. W. K. Chu, S. V. Campisano, J. W. Mayer, E. Rimini and M.-A. Nicolet, Catania Working Data.
5. Andersen · 1977
6. Rönnquist · J. Inst. Metals · 1960 · 89 · 65
7. Dennison · J. Inst. Metals · 1952 · 81 · 229
8. Sanderson · Oxid. Metals · 1971 · 3 · 5910.1007/BF00604740 ↗
9. Jarzebski · 1973