Precise characterization of atomic-scale corrosion of single crystal diamond in H2 plasma based on MEMS/NEMS
Source abstract
Abstract
Abstract It is well known that single crystal diamond (SCD) could be etched in hydrogen plasma ambient. However, the precise characterization of the corrosion behavior of SCD is not well understood. Here, we utilize the shift of single crystal diamond (SCD) cantilever’s resonance frequency to characterize the corrosion rate of SCD with (100) oriented surface in hydrogen plasma at the temperatures of 800−900 °C. The etching rate increased from ∼3.3 nm/hour at 800 °C to ∼7 nm/hour at 900 °C. This work helps understanding the stability of diamond for applications from mechanical to electronic devices as well as the dynamic growth of diamond.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Force Microscopy Techniques and Applications · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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