The determination of stresses during oxidation of Ni: in situ measurements by XRD at high temperature
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: ZnO doping and properties · Semiconductor materials and devices · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (24)
Show source-provided references
1. Liu · Mater. Technol. · 1989 · 7/8 · 17
2. Liu · 1991 · Vol. 2 · 963
3. Liu · Z. Metall. · 1992
4. Atkinson · Rev. Mod. Phys. · 1985 · 57 · 43710.1103/RevModPhys.57.437 ↗
5. Atkinson · Oxid. Metals · 1987 · 28 · 35310.1007/BF00666728 ↗
6. Caplan · J. electrochem. Soc. · 1972 · 119 · 120510.1149/1.2404444 ↗
7. Aubry · Acta Metall. · 1988 · 1 · 277910.1016/0001-6160(88)90124-1 ↗
8. Aubry · 1985
9. Courty · 1988 · 360
10. Courty · 1988
11. Courty · Mém. Etudes Sci. Revue Métall. · 1989 · 39 · 309
12. Jayaraman · J. Mater. Sci. · 1989 · 24 · 132710.1007/BF02397067 ↗
13. Bernstein · Metall. Trans. · 1987 · A18 · 97510.1007/BF02668546 ↗
14. Barnes · Oxid. Metals · 1989 · 32 · 44910.1007/BF00665449 ↗
15. Touati · 1991
16. Touati · 1991
17. Maeder · 1988 · 248
18. Liu · Mater. Sci. Engng · 1992
19. Liu · 1992
20. Liu · 1991
21. Homma · 1983 · 161
22. Stout · Mater. Sci. Engng · 1989 · A120 · 19310.1016/0921-5093(89)90739-9 ↗
23. Bennett · 1990 · 51
24. Diot · 1988 · 273