Formation of barrier-type anodic films on sputtering-deposited Al–Ti alloys
Source abstract
Abstract
The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al–Ti alloys containing from 3–30 at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Semiconductor materials and devices · Anodic Oxide Films and Nanostructures · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (29)
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