Enhanced oxidation resistance in refractory niobium by surface Ti+/Si+ implantation
Source abstract
Abstract
Abstract Massive oxides growth during service inevitably degrade the performance of oxygen sensitive refractory metals. Here, we propose to improve the oxidation resistance of niobium by surface implantation of Ti+ and Si+. After oxidation, oxides in niobium not only form at topmost surface, but also massively grow along {100} planes. In contrast, oxides at top surface can be efficiently suppressed by implantation of Ti+ and Si+. No detectable oxides were formed after Si+ implantation, while some laminated oxides bundles can still be detected in Ti+ implanted sample, indicating Si+ has a stronger effect in improving oxidation resistance.
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Research context
OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · ZnO doping and properties
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