Improvement of corrosion resistance and mechanism analysis for self-assembled vinyltriethoxysilane (VS) films on low carbon steel using a novel chemical etching method
Source abstract
Abstract
Abstract Vinyltriethoxysilane (VS) films with improved corrosion resistance and uniform thickness (∼2.8 μm) were fabricated on low carbon steel using a novel chemical etching method. The film forming mechanism occurred on the etched metal was investigated by experimental and theoretical methods. Results reveal that the metal hydroxylation and micro-rough surface generated in H2O2-containing etchant contribute to the enhancement of interfacial adhesion and protective performance for self-assembled films. However, there is an optimal etching time about 4 min forming denser interfacial layer with high adhesion of grade 1. Prolonged etching will cause inversely deterioration of the formed VS films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Corrosion Behavior and Inhibition · Surface Modification and Superhydrophobicity · Concrete Corrosion and Durability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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