High temperature oxidation behavior of ZrNiSn-based half-Heusler thermoelectric material
Source abstract
Abstract
The peculiar oxidation behavior of Zr 0.5Hf 0.5NiSn 0.985Sb 0.015 (ZHNS) under different temperatures has been investigated. ZHNS presents thermal inert at 823–1073 K, but shows large oxidation rate at 723–773 K. The thermodynamic and kinetic analyses reveal that, dense oxidation layer (DOL, composed of ZrO 2, HfO 2 and Ni 3Sn 2) is preferentially generated at high temperatures and/or low oxygen pressures, while alternative layers of (ZrO 2, HfO 2, SnO 2)/Ni 3Sn 2 with abundant cracks at lower temperatures. By pre-oxidization at 873 K in Ar flow, an artificial DOL oxidation-protective coating is fabricated. With this coating, the single-leg thermoelectric device demonstrates excellent stability in air at temperature gradient of 778 K/300 K for 15 days.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced Thermoelectric Materials and Devices · Thermal properties of materials · Heusler alloys: electronic and magnetic properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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