Pitting corrosion – Preferred chloride diffusion pathways in physical vapor deposited AlCrN coatings
Source abstract
Abstract
Pitting corrosion of sputtered and arc evaportaed fcc-AlCrN coated low-alloy steel substrates was studied in a 0.1 M NaCl solution, using a three-electrode-cell. Depending on the deposition technique, several diffusion mechanisms were identified by high-resolution techniques (i.e. APT, TOF-SIMS). For arc evaporated AlCrN, incoherently embedded macro-particles provided the majority of fast-track diffusion pathways and pit-initiation sites, while their pristine coating matrix proved protective against chloride inward diffusion. Contrarily, the more coarse-grained sputtered AlCrN morphology with a highly orientated crystal growth featured diffusion paths along column boundaries, where chloride permeated the coating structure and initiated pit formations at the coating-substrate interface.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Ion-surface interactions and analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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