Oxidation behavior of Al-Cr-Nb-Si-Zr high entropy nitride thin films at 850 °C
Source abstract
Abstract
Abstract Oxidation behavior of Al-Cr-Nb-Si-Zr high entropy nitride (HEN) thin films was investigated in air atmosphere at 850 °C. The thermo-gravimetric analyzer (TGA) results show that oxidation kinetics of HEN films followed the parabolic rate law. A triple oxide layer, Al2O3/Cr2O3/Al2O3, was found with nanocrystalline ZrO2 dispersed in the oxide scales. Through Au nanoparticles as diffusion markers, the formation of the scales was mainly due to the outward diffusion of cations in the beginning, and the dominant diffusion species were changed to inward diffusion of anions in longer oxidation periods.
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Research context
OpenAlex topics: High Entropy Alloys Studies · High-Temperature Coating Behaviors · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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