High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior
Source abstract
Abstract
Abstract High vacuum arc ion plating gas-free Cr films under self-ion bombarding and their oxidation behaviours were investigated. Ultrafine column-grained Cr films were obtained, which showed stronger crystallographic orientation of (200) as the bombarding energy increased from 50 eV to 250 eV. Oxidation of the Cr films at 900 °C revealed that the thickness of the chromia scale decreased with enhanced bombarding energy. The thickness decreases over 56 % due to the elimination of gas inclusion but only around 18 % further by introducing orientation in the film, demonstrating the key role of high vacuum for depositing advanced Cr films.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Advanced materials and composites · Semiconductor materials and devices
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References (44)
Show source-provided references
1. Oxidation kinetics of Cr-coated zirconium alloy: effect of coating thickness and microstructure10.1016/j.corsci.2020.108883 ↗
2. An interesting oxidation phenomenon of Cr coatings on Zry-4 substrates in high temperature steam environment10.1016/j.corsci.2019.05.017 ↗
3. Self-ion bombarded Cr films: crystallographic orientation and oxidation behaviour10.1016/j.corsci.2018.08.016 ↗
4. Corrosion behaviour of chromium coatings obtained by direct and reverse pulse plating electrodeposition in NaCl aqueous solution10.1016/j.corsci.2013.10.005 ↗
5. High temperature steam oxidation of chromium-coated zirconium-based alloys: kinetics and process10.1016/j.corsci.2020.108537 ↗
6. Thermal damage of conventional hard chromium coatings on 416 stainless steel10.1016/j.engfailanal.2019.07.007 ↗
7. Crystalline chromium electroplating with high current efficiency using chloride hydrate melt-based trivalent chromium baths10.1016/j.electacta.2020.135873 ↗
8. Energetically deposited nano-composite films of high speed steel and titanium nitride10.1016/j.surfcoat.2014.10.041 ↗
9. Synthesis of advanced aluminide intermetallic coatings by low-energy Al-ion radiation
10. High vacuum arc ion plating TiAl coatings for protecting titanium alloy against oxidation at medium high temperatures10.1016/j.corsci.2016.07.005 ↗
11. High vacuum arc ion plating NiCrAlY coatings: bias effect and approach to preparation of functional gradient coatings10.1016/j.surfcoat.2015.09.043 ↗
12. Microstructure, corrosion resistance and oxidation behavior of Cr-coatings on Zircaloy-4 prepared by vacuum arc plasma deposition10.1016/j.corsci.2019.06.029 ↗
13. High temperature steam-oxidation behavior of arc ion plated Cr coatings for accident tolerant fuel claddings10.1016/j.surfcoat.2015.09.022 ↗
14. High vacuum arc ion plating NiCrAlY coatings: microstructure and oxidation behavior10.1016/j.corsci.2015.02.032 ↗
15. Sputtering of Cu atoms by Ar ions10.1007/BF02565201 ↗
16. UHV arc for high quality film deposition10.1016/j.surfcoat.2006.08.017 ↗
17. Oxidation mechanism of a nanocrystalline NiCrAlYSiHfN/AlN multilayer coating10.1016/j.corsci.2019.05.009 ↗
18. The effect of nanocrystallization on the selective oxidation and adhesion of Al2O3 scales10.1007/BF01670500 ↗
19. Oxidation behavior of NiCrAlY coatings prepared by arc ion plating using various substrate biases: effects of chemical composition and thickness of the coatings10.1016/j.corsci.2017.07.014 ↗
20. Giancoli · 2000
21. Effect of substrate temperature and bias voltage on the crystallite orientation in RF magnetron sputtered AlN thin films10.1016/j.tsf.2005.12.145 ↗
22. Effect of self-ion bombardment on the corrosion behavior of zirconium10.1016/j.nimb.2003.09.016 ↗
23. Effect of self-ion bombardment damage on high temperature oxidation behavior of Zircaloy-410.1016/S0022-3115(97)00346-2 ↗
24. Low-resistivity Cu thin-film deposition by self-ion bombardment10.1063/1.103024 ↗
25. The effects of self-ion bombardment (30-500 keV) on the surface topography of single-crystal germanium10.1063/1.331636 ↗
26. Oxygen chemisorption and corrosion on Cr(100) and Cr(110) single crystal surfaces10.1016/0039-6028(85)90824-6 ↗
27. Effects of crystallographic orientation on the early stages of oxidation in nickel and chromium10.1007/s10853-009-4144-x ↗
28. Crystallographic orientation control of pure chromium via laser powder bed fusion and improved high temperature oxidation resistance
29. High temperature steam oxidation of chromium-coated zirconium-based alloys: kinetics and process10.1016/j.corsci.2020.108537 ↗
30. Corrosion resistance enhancement of electroless Ni-P coating by incorporation of ultrasonically dispersed diamond nanoparticles10.1016/j.corsci.2013.07.046 ↗
31. Converting polycrystals into single crystals – selective grain growth by high-energy ion bombardment10.1016/j.actamat.2006.07.005 ↗
32. Cyclic oxidation and rumpling behaviour of single phase β-(Ni,Pt)Al coatings with different thickness of initial Pt plating10.1016/j.corsci.2016.05.011 ↗
33. Ab initio calculations of lattice stability of sigma-phase and phase diagram in the Cr-Fe system10.1016/S0927-0256(02)00335-X ↗
34. Effect of ion bombardment on low-temperature growth of TiO2 thin films in DC reactive sputtering with two sputtering sources10.1016/j.surfcoat.2012.01.003 ↗
35. Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films10.1016/j.actamat.2017.09.007 ↗
36. Thermal oxidation of single-crystal aluminum at 550 °C10.1007/BF00659003 ↗
37. Oxidation characteristics of basal (0002) plane and prism (11-20) plane in HCP Zr10.1016/S0022-3115(02)01226-6 ↗
38. Influence of crystal orientation on copper oxidation failure10.1016/j.apsusc.2009.01.040 ↗
39. The influence of crystallographic orientation on the oxidation of Cu10.1016/S0010-938X(68)90072-3 ↗
40. Microstructure and high-temperature steam oxidation properties of thick Cr coatings prepared by magnetron sputtering for accident tolerant fuel claddings: The role of bias in the deposition process10.1016/j.corsci.2019.108378 ↗
41. On high temperature oxidation of chromium I. Oxidation of annealed, thermally etched chromium at 800-1100 °C10.1149/1.2129478 ↗
42. On high temperature oxidation of chromium: II. properties of Cr2O3 and the oxidation mechanism of chromium10.1149/1.2129481 ↗
43. Effect of substrate bias and hydrogen addition on the residual stress of BCN film with hexagonal structure prepared by sputtering of a B4C target with Ar/N2 reactive gas10.1016/j.tsf.2013.06.041 ↗
44. Effect of bias voltage on the oxidation resistance of NiCoCrAlYTa coatings prepared by arc ion plating10.1016/j.corsci.2018.11.030 ↗