Enhanced scratch resistance of flexible carbon fiber-reinforced polymer composites by low temperature plasma-polymerized organosilicon oxynitride: The effects of nitrogen addition
Source abstract
Abstract
Abstract An investigation is conducted on enhanced scratch resistance of flexible carbon fiber-reinforced polymer composites (FCFRPCs) by low temperature plasma-polymerized organo-silicon oxynitride (SiOxCyNz) at varying N2 concentrations. It is found that the organic–inorganic hybrid films (SiOxCyNz) deposited on FCFRPCs using tetramethylsilane (TMS) O2 N2 plasmas at low temperature dramatically improve the scratch resistance of FCFRPCs. Scratch resistance is greatly enhanced from an overwhelming presence of scratching (100%) on untreated FCFRPCs to a complete lack of scratching (0%) on TMS O2 N2 plasma-polymerized FCFRPCs with steel wool for 250 cycles at 200 g loading. The scratch resistance of FCFRPCs is found to be highly dependent on their surface characteristics including hardness, surface morphology, surface compositions and chemical bonds of TMS O2 N2 plasma-polymerized SiOxCyNz.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Polymer Nanocomposite Synthesis and Irradiation
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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