Methods for Defect Evaluation of Thin <100> Oriented Silicon Epitaxial Layers Using a Wet Chemical Etch
Source abstract
Abstract
Wet chemical defect etch diagnostic methods for <100> oriented silicon have been developed which have been used to evaluate epitaxial layers as thin as 4000Å.
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Silicon and Solar Cell Technologies · Semiconductor materials and interfaces
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Affiliations
Bell Laboratories, Incorporated, Holmdel, New Jersey 07733
References
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