journal article·2023-11

Characteristics of transparent cured film patterns prepared from sol-gel-derived positive-type photosensitive oligomeric silsesquioxanes with random structure

Mitsuhito Suwa, Manami Fujii, Masao Kamogawa, Hiromitsu Kozuka

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OpenAlex topics: Silicone and Siloxane Chemistry · Surface Modification and Superhydrophobicity · Aerogels and thermal insulation

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References (37)

Show source-provided references
1. Suzuki M, Sasaki H, Nishimura I, Yonezawa F, Endo M, Niwa K (2004) Radiation-sensitive composition, insulating film and organic EL display element. US Patent 6797450B2
2. Tomikawa M, Suwa M, Yoshida S, Fujita Y, Okuda R, Ohbayashi G (2000) Novel positive-type photosensitive polyimide coatings “PW-1000”. J Photopolym Sci Technol 13:357–36010.2494/photopolymer.13.357 ↗
3. Okuda R, Miyoshi K, Arai N, Tomikawa M, Ohbayashi G (2002) Low-temperature-curing type positive-tone photosensitive polyimide coatings for insulating layer in OLED displays. J Photopolym Sci Technol 15:205–20810.2494/photopolymer.15.205 ↗
4. Okuda R, Miyoshi K, Arai N, Tomikawa M (2004) Polyimide coatings for OLED applications. J Photopolym Sci Technol 17:207–21410.2494/photopolymer.17.207 ↗
5. Aoai T, Yamanaka T, Yagihara M (1997) Structural effect of polymer and inhibitor on alkali dissolution and dissolution inhibition characteristics. J Photopolym Sci Technol 10:387–39610.2494/photopolymer.10.387 ↗
6. Miyagawa K, Naruse K, Ohnishi S, Yamaguchi K, Seko K, Numa N, Iwasawa N (2001) Study on thermal crosslinking reaction of o-naphthoquinone diazides and application to electrodeposition positive photoresist. Prog Org Coat 42:20–2810.1016/S0300-9440(01)00155-2 ↗
7. Shimada T, Kajitani M, Okamoto M, Kondo N, Katayama M, Sakihana Y, Yamamoto A, Nakata Y, Nishiki H, Shimada Y (2000) Transmission type liquid crystal display device with connecting electrode and pixel electrode connected via contact hole through interlayer insulating film and method for fabricating. US Patent 6052162
8. Schwab JJ, Lichtenhan JD (1998) Polyhedral oligomeric silsesquioxane (POSS)-based polymers. Appl Organomet Chem 12:707–71310.1002/(SICI)1099-0739(199810/11)12:10/11<707::AID-AOC776>3.0.CO;2-1 ↗
9. Matsuda A, Sasaki T, Tatsumisago M, Minami T (2000) Micropatterning on methylsilsesquioxane–phenylsilsesquioxane thick films by the sol-gel method. J Am Ceram Soc 83:3211–321310.1111/j.1151-2916.2000.tb01708.x ↗
10. Abe Y, Gunji T (2004) Oligo- and polysiloxanes. Prog Polym Sci 29:149–18210.1016/j.progpolymsci.2003.08.003 ↗
11. Liu H, Kondo S, Tanaka R, Oku H, Unno M (2008) A spectroscopic investigation of incompletely condensed polyhedral oligomeric silsesquioxanes (POSS-mono-ol, POSS-diol and POSS-triol): Hydrogen-bonded interaction and host-guest complex. J Organomet Chem 693:1301–130810.1016/j.jorganchem.2008.01.027 ↗
12. Handke M, Handke B, Kowalewska A, Jastrzebski W (2009) New polysilsesquioxane materials of ladder-like structure. J Mol Struct 924–926:254–26310.1016/j.molstruc.2008.11.039 ↗
13. Ervithayasuporn V, Abe J, Wang X, Matsushima T, Murata H, Kawakami Y (2010) Synthesis, characterization, and OLED application of oligo(p-phenylene ethynylene)s with polyhedral oligomeric silsesquioxanes (POSS) as pendant groups. Tetrahedron 66:9348–935510.1016/j.tet.2010.10.009 ↗
14. Tashiro Y, Miyazato A, Ebitani K (2015) One-pot synthesis of oligo-ladder phenylsilsesquioxanes via pyridine–silicon adduct formation at aqueous–organic liquid boundary. J Inorg Organomet Polym 25:1353–136110.1007/s10904-015-0247-9 ↗
15. Yoshida N, Bermundo JP, Ishikawa Y, Nonaka T, Uraoka Y (2018) Photosensitive polysiloxane passivation fabricated at low temperature for highly reliable amorphous InGaZnO thin-film transistors. Jpn J Appl Phys 57:090306–510.7567/JJAP.57.090306 ↗
16. Brown Jr JF, Vogt Jr LH, Katchman A, Eustance JW, Kiser KM, Krantz KW (1960) Double chain polymers of phenylsilsesquioxane. J Am Chem Soc 82:6194–619510.1021/ja01508a054 ↗
17. Brown JF, Vogt LH, Prescott PI (1964) Preparation and characterization of the lower equilibrated phenylsilsesquioxanes. J Am Chem Soc 86:1120–112510.1021/ja01060a033 ↗
18. Inoue T, Sugiyama H, Nate K, Mizushima A (1989) Photosensitive organosilicon polymers for microlithographic application. Makromol Chem Macromol Symp 24:189–19910.1002/masy.19890240119 ↗
19. Sachdev HS, Whitaker JR, Sachdev KG (1993) New silicon containing positive resist and its applications for sub-half micron lithography. Microelectron Eng 21:223–22610.1016/0167-9317(93)90060-I ↗
20. Smaihi M, Jermoumi T, Marignan J (1995) Structural study of poly(phenylsilsesquioxane) sol-gel materials. Chem Mater 7:2293–229910.1021/cm00060a017 ↗
21. Lee E, Kimura Y (1998) Synthesis and polycondensation of a cyclic oligo(phenylsilsesquioxane) as a model reaction for the formation of poly(silsesquioxane) ladder polymer. Polym J 30:730–73510.1295/polymj.30.730 ↗
22. Duchateau R (2002) Incompletely condensed silsesquioxanes: versatile tools in developing silica-supported olefin polymerization catalysts. Chem Rev 102:3525–354210.1021/cr010386b ↗
23. Takamura N, Gunji T, Hatano H, Abe Y (1999) Preparation and properties of polysilsesquioxanes: polysilsesquioxanes and flexible thin films by acid-catalyzed controlled hydrolytic polycondensation of methyl- and vinyltrimethoxysilane. J Polym Sci A Polym Chem 37:1017–102610.1002/(SICI)1099-0518(19990401)37:7<1017::AID-POLA16>3.0.CO;2-F ↗
24. Feher FJ, Terroba R, Ziller JW (1999) A new route to incompletely condensed silsesquioxanes: Base-mediated cleavage of polyhedral oligosilsesquioxanes. Chem Commun 22:2309–231010.1039/a906242d ↗
25. Tashiro Y, Sekito T, Iwata T, Yokoyama D, Nonaka T (2008) Development of photosensitive silsesquioxane. Proc SPIE 7140:71402O–1110.1117/12.804669 ↗
26. Park ES, Ro HW, Ngnyen CV, Jaff RL, Yoon DY (2008) Infrared spectroscopy study of microstructures of poly(silsesquioxane)s. Chem Mater 20:1548–155410.1021/cm071575z ↗
27. Loy DA, Baugher BM, Baugher CR, Schneider DA, Rahimian K (2000) Substituent effects on the sol-gel chemistry of organotrialkoxysilanes. Chem Mater 12:3624–363210.1021/cm000451i ↗
28. Baney RH, Itoh M, Sakakibara A, Suzuki T (1995) Silsesquioxanes. Chem Rev 95:1409–143010.1021/cr00037a012 ↗
29. Tashiro Y, Miyazato A, Ebitani K (2015) Characterization of photosensitive composition based on oligo-ladder phenylsilsesquioxane. J Photopolym Sci Technol 28:239–24510.2494/photopolymer.28.239 ↗
30. Suwa M, Kamogawa M, Fujii M, Nishiyama T, Kozuka H (2021) Intermolecular interactions between sol-gel-derived random-structure oligomeric silsesquioxanes and a diazonaphthoquinone derivative. Jpn J Appl Phys 60:051002–910.35848/1347-4065/abf13c ↗
31. Suwa M, Kamogawa M, Fujii M, Nishiyama T, Kozuka H (2022) Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative. J Vac Sci Technol B 40:022602–1210.1116/6.0001717 ↗
32. Kolezynski A, Jastrzebski W, Szczypka W, Kowalewska A, Nowacka M, Sitarz M (2013) The structure and bonding properties of chosen phenyl ladder-like silsesquioxane clusters. J Mol Struct 1044:314–32210.1016/j.molstruc.2012.12.013 ↗
33. Unno M, Matsumoto H (2007) Synthesis of laddersiloxanes by novel stereocontrolled approach. J Organomet Chem 692:307–31210.1016/j.jorganchem.2006.08.068 ↗
34. Zhang ZX, Hao J, Xie P, Zhang X, Han CC, Zhang R (2008) A well-defined ladder polyphenylsilsesquioxane (Ph-LPSQ) synthesized via a new three-step approach: monomer self-organization-lyophilization-surface-confined polycondensation. Chem Mater 20:1322–133010.1021/cm071602l ↗
35. Smith AL, Anderson DR (1984) Vibrational spectra of Me2SiCl2, Me3SiCl, Me3SiOSiMe3, (Me2SiO)3, (Me2SiO)4, (Me2SiO)x, and their deuterated analogs. Appl Spectrosc 38:822–83410.1366/0003702844554549 ↗
36. Szczypka W, Jelen K, Andrzej K (2014) Theoretical studies of bonding properties and vibrational spectra of chosen ladder-like silsesquioxane clusters. J Mol Struct 75:599–60410.1016/j.molstruc.2014.05.037 ↗
37. Sato Y, Hayami Y, Gunji T (2022) Characterization of NMR, IR, and Raman spectra for siloxanes and silsesquioxanes: a mini review. J Sol Gel Sci Technol 104:36–5210.1007/s10971-022-05920-y ↗