Low-Friction Coatings Grown on Cemented Carbides by Modulating the Sputtering Process Parameters of TiN Targets

TiN thin films are widely used as protective and decorative coatings for tools in industry. Previous studies have focused on the deposition of TiN coatings on substrates by reactive magnetron sputtering, whereas the use of TiN targets avoids problems such as ‘nitrogen contamination’ and ‘target poisoning’. TiN coatings were grown on silicon wafers and cemented carbide substrates by varying the parameters of the magnetron sputtering plasma source, operating Ar pressure and deposition temperature. The experimental results show the better mechanical properties of ceramic materials deposited using radio frequency (RF) magnetron sputtering. During RF magnetron sputtering, the hardness of the coating increased significantly to 17 Gpa when the deposition working pressure was reduced from 1.5 Pa to 0.5 Pa. The coefficient of friction tends to decrease as the deposition temperature increases, and at 400 °C the coefficient of friction between the deposited film and the friction pair made of Al2O3 material is only 0.36. The nano-scratch experimental tests concluded that the TiN coatings deposited at 300 °C conditions had the best adhesion to the substrate at an Ar pressure of 0.5 Pa under an RF source.