Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity
Source abstract
Abstract
(CrMoNbTaZr)NX coatings were deposited on Si (100) by magnetron sputtering under various N2/(Ar+N2) flow ratios. An X-ray diffractometer, transmission electron microscopy, scanning electron microscopy and atomic force microscopy were used to characterize the crystallinity and microstructure of the films. The elemental composition was characterized by energy dispersive spectroscopy and X-ray photoelectron spectroscopy. The hardness and friction coefficient were respectively determined by nanoindentation and nanoscratch. The sheet resistance was studied using a four-point probe. The results suggest that the crystallinity is strongly influenced by the nitrogen content in the films. The chemical stoichiometry of nitride determines the evolutions of the microstructure, mechanical properties and resistivity. Correlations between the microstructure and the properties of the (CrMoNbTaZr)NX films were studied.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · High Entropy Alloys Studies · Advanced materials and composites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Fujian Provincial Key Laboratory of Advanced Materials Processing and Application, Fujian University of Technology, Fuzhou 350118, China
Fujian Acetron New Materials Co., Ltd., Fuzhou 350209, China
Institute of Industry and Equipment Technology, Hefei University of Technology, Hefei 230009, China
Funding
Fujian STS Program · Open Fund Project of Fujian Provincial Key Laboratory of Advanced Materials Processing and Application · Major Science and Technology Project of Fujian Province · Fuzhou Science and Technology Plan Projects
References (70)
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