journal article·2024-08-06Open access

Exploring the Development of Photoresists in Lacquer under the Background of Global Carbon Neutrality: A Mini Review

Yong Zheng, Xin Xin, Qingshuo Yang, Zhijia Zhang, Zhijie Zhou, Yunlong Ma

Coatings· Volume 14· Issue 8

Abstract

With the establishment of a global carbon-neutral target, green and sustainable design concepts, materials, and processes have become the key to scientific and technological innovation, which highlights the development and utilization of environmentally-friendly materials and renewable energy sources. At present, almost all the raw materials in commercial photoresist are from oil resources. In order to implement the policy of “green chemistry”, there is an urgent need to take the place of petroleum with renewable, biodegradable, and green biomass resources in photoresist production. As a kind of green and natural high polymer material from China, lacquer has excellent physical and chemical properties and has great application potential in the field of electronics. In this paper, the potential connections between photoresist and lacquer, especially in the green development of photoresist, are sorted out. The introduction of lacquer and its derivatives may help to improve the environmentally-friendly production of photoresist and its performance. Therefore, in the context of global carbon neutrality, the study of photoresists in the “lacquer” is of great significance in promoting the application of eco-friendly materials in the field of microelectronics.
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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Electron and X-Ray Spectroscopy Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Arts, Tiangong University, Tianjin 300387, China

School of Material Science and Engineering, Tiangong University, Tianjin 300387, China

Funding

ational Natural Science Foundation of China

References (40)

Show source-provided references
1. Development and Application of Microelectronic Photoresist
2. Trends in photoresist materials for extreme ultraviolet lithography: A review10.1016/j.mattod.2023.05.027 ↗
3. Li, D., Li, K., and Fang, J. (2022). Research Progress on Modification and Application of Raw Lacquer. ChemistrySelect, 7.10.1002/slct.202200943 ↗
4. A solvent-free and scalable method to prepare alkali soluble soybean oil-based epoxy acrylic resin for photoresist application10.1016/j.indcrop.2022.115877 ↗
5. Synthesis and characterization of a novel tri-functional bio-based methacrylate prepolymer from castor oil and its application in UV-curable coatings10.1016/j.indcrop.2019.04.039 ↗
6. Su, Y., Zhang, S., Chen, Y., Yuan, T., and Yang, Z. (2020). One-step synthesis of novelrenewable multi-functional linseed oil-based acrylate prepolymers and its +application in UV-curable coatings. Prog. Org. Coat., 148.10.1016/j.porgcoat.2020.105820 ↗
7. Xiao, Q., Cao, Y., Zheng, W., Hou, T., Gao, S., Lyu, J., Xiao, H., Chen, Y., and Chen, M. (2023). Kinetics of thermal degradation of raw lacquer enhanced by formaldehyde urea prepolymer. Sci. Rep., 13.10.1038/s41598-023-28787-7 ↗
8. Ko, M., Jung, J., Hwang, S.S., and Won, J. (2020). Design and development of trivalent fe ion-induced novel urushi organogels. Polymer, 205.10.1016/j.polymer.2020.122835 ↗
9. The “Chemical” Talk about National Lacquer-Popularizing Lacquer Chemistry, Transmitting Lacquer Art and Intangible Cultural Heritage
10. Advances in chemical amplification resist systems10.1143/JJAP.31.4273 ↗
11. Kozawa, T., and Tagawa, S. (2010). Radiation chemistry in chemically amplified resists. Jpn. J. Appl. Phys., 49.10.1143/JJAP.49.030001 ↗
12. Li, Z., Liu, T., Duan, C., Gu, Y., and Zhang, Z. (2023). Application and Research Progress of Copper Current Collector in Alkali Metal Batteries. Copp. Eng., 1–13.
13. Zhang, Y., Wang, W., Wang, Y., and Zhang, Y. (2023). ZnS Encapsulated in N/S Co-Doped Carbon Fiber as a Composite Material for Li Storage. Copp. Eng., 23–31.
14. Wei, S., Jia, X., Guo, J., and Li, D. (2023). Biomass-Based Carbon Derived from Poplar Catkins as Sodium Ion Anode Ma-terial. Copp. Eng., 32–38.
15. Progress in resolution, sensitivity, and critical dimensional uniformity of EUV chemically amplified resists
16. Peng, X., Wang, Y., Xu, J., Yuan, H., Wang, L., Zhang, T., Guo, X., Wang, S., Li, Y., and Yang, G. (2018). Molecular glass photoresists with high resolution, low LER, and high sensitivity for EUV lithography. Macromol. Mater. Eng., 303.10.1002/mame.201700654 ↗
17. Wang, Y., Chen, L., Yu, J., Guo, X., Wang, S., and Yang, G. (2021). Negative-tone molecular glass photoresist for high-resolution electron beam lithography. R. Soc. Open Sci., 8.10.1098/rsos.202132 ↗
18. Difference in EUV photoresist design towards reduction of LWR and LCDU
19. Direct laser writing of four-dimensional structural color microactuators using a photonic photoresist10.1021/acsnano.0c02481 ↗
20. Liu, B. (1980). About the quality inspection of raw lacquer. Biomass Chem. Eng., 148–153.
21. Difference between acid generation mechanisms in poly (hydroxystyrene)-and polyacrylate-based chemically amplified resists upon exposure to extreme ultraviolet radiation10.1143/JJAP.47.7125 ↗
22. Lithography based on molecular glasses10.2494/photopolymer.18.431 ↗
23. Preparation and properties of nano-silica modified negative acrylate photoresist10.1016/j.tsf.2008.04.051 ↗
24. Organic Polymeric Coatins for Silica-Fibers.1. UV-Curing Epocy Acryate10.1002/app.1979.070230107 ↗
25. Liu, T., Li, Z., Gu, Y., Duan, C., and Zhang, Z. (2023). Research Progress of Cu Doping in Sodium-Ion Battery Cathode. Copp. Eng., 14–22.
26. Li, H., Chang, S., and Zhang, M. (2023). Research Progress on Properties Tuning and Products of Cu-Based Catalyst in Electrocatalytic CO2 Reduction. Copp. Eng., 38–50.
27. Modification of Siliconized Epoxy Resin Using Multifuctional Silanes10.1080/00914030490263441 ↗
28. Synthesis and Characterization of Hyperbranched-Poly(Siloxysilane)-basedPolymeric Photoinitiators10.1002/pola.21439 ↗
29. Preparation of dual-curable polysiloxane and the properties of its cured films with epoxy resin10.1177/8756087910387241 ↗
30. Xia, J. (2011). Research on UV Curing Natural Raw Lacquer and Its Composite System. [Ph.D. Thesis, Fujian Normal University].
31. Stability in Appearance of Oriental Lacquer Film under Various Atmospheres10.1295/koron.58.29 ↗
32. Toward 10 nm half-pitch in EUV lithography: Results on resist screeningand pattern collapse mitigation techniques10.1117/12.2085936 ↗
33. Adhesion improvement of photoresist: Destruction mode analysis
34. Resist behaviour during peeling release in nano-imprint lithography
35. Chen, R., Wang, X., Li, X., Wang, H., He, M., Yang, L., Guo, Q., Zhang, S., Zhao, Y., and Li, Y. (2021). A comprehensive nano-interpenetrating semiconducting photoresist toward all-photolithography organic electronics. Sci. Adv., 7.10.1126/sciadv.abg0659 ↗
36. Study of poly(vinylpyrrolidone)-hybridized two-color photosensitive laser direct-write photoresists
37. STED-Inspired Laser Lithography Based on Photoswitchable Spirothiopyran Moieties10.1021/acs.chemmater.8b04696 ↗
38. Lim, G., Lee, K., Choi, S., and Yoon, H.J. (2023). Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms. Coord. Chem. Rev., 493.10.1016/j.ccr.2023.215307 ↗
39. Reduction of photoresist usage during spin coating10.1007/s11664-001-0055-6 ↗
40. Characteristics of material for photoresist spin coating: Property for reduction of photoresist consumption10.1143/JJAP.37.L1448 ↗