journal article·2022-07-18Open access

The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System

Stephen T. Hsieh, Himanshu Mishra, Nima Bolouki, Weite Wu, Chuan Li, Jang-Hsing Hsieh

Coatings· Volume 12· Issue 7

Abstract

A plasma system attached with one internal coil (for generating inductively coupled plasma) and two sputtering carbon targets was set up to deposit PP-MMA (plasma polymerized methyl methacrylate) thin films. PP-MMA was used as a model material in the present study. In the experiment, the working pressure and Ar/MMA flow ratio were varied, which resulted in the change in plasma conditions as well as the deposition rates. The optical emission spectroscopy (OES) method was applied to identify the presence of the excited species related to the fragmented monomer. In addition, the electron temperature and electron density were determined using the modified Boltzmann plot and line-ratio method, according to the measured OES spectra. The deposition rate of the PMMA film was then correlated with the determined plasma characteristics. To determine the vibrational modes of the deposited PP-MMA films, Fourier transformed infrared spectrometry (FTIR) was used. The highest deposition rate of PP-MMA could be obtained with the optimized working pressure and Ar/MMA volume ratio. This could be related to the plasma characteristics that contribute to the fragmentation of the monomer in the plasma.
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Research context

OpenAlex topics: Plasma Diagnostics and Applications · Ion-surface interactions and analysis · Surface Modification and Superhydrophobicity

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Materials Science and Engineering Program, University of California, Riverside, CA 92521, USA

Faculty of Mathematics and Physics, Charles University, 180 00 Prague, Czech Republic

Department of Physical Electronics, Faculty of Science, Masaryk University, 601 77 Brno, Czech Republic

Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 24301, Taiwan

Metals Research and Development Center, National Chung Hsing University, Taichung 402, Taiwan

Department of Biomedical Engineering, National Yang Ming Chiao Tung University, Taipei 300093, Taiwan

Department of Chemical and Materials Engineering, Center for Green Technology, Chang Gung University, Taoyuan City 33302, Taiwan

Funding

Ministry of Science and Technology

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