Controlling the Surface Roughness of Surface-Electrode Ion Trap Based on Micro-Nano Fabrication

The surface-electrode ion trap is one of the most promising devices to realize large-scale and integrated quantum information processing. However, a series of problems are faced in the micro-nano fabrication of surface-electrode ion traps. A prominent one is the difficulty to control the thick film surface roughness. A rough electrode surface could produce excessive radio frequency (RF) loss and deteriorate trapping ability of the surface-electrode ion trap. In this paper, a thick film micro-nano fabrication technology to control the surface roughness is presented, which can reduce the roughness of thick film surface-electrode down to 6.2 nm, while being controllable between 6.2 nm and 45 nm. Therefore, it can also provide a basis for studying the influence of electrode surface roughness on trap performance. The micro-nano fabrication technology is not only suitable for surface-electrode ion traps with various configurations, but also be further applied to researches of MEMS, solar cells and surface science.