Advanced Strategies in Thin Films Engineering by Magnetron Sputtering
Source abstract
Abstract
This Special Issue contains a series of reviews and papers representing some recent results and some exciting perspectives focused on advanced strategies in thin films growth, thin films engineering by magnetron sputtering and related techniques. Innovative fundamental and applied research studies are then reported, emphasizing correlations between structuration process parameters, new ideas and approaches for thin films engineering and resulting properties of as-deposited coatings.
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Research context
OpenAlex topics: Semiconductor materials and devices · Metal and Thin Film Mechanics · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Instituto de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla), Americo Vespucio 49, 41092 Sevilla, Spain
Institut FEMTO-ST, UMR 6174, CNRS, University Bourgogne Franche-comté, 15B, Avenue des Montboucons, 25030 Besançon, France
References (26)
Show source-provided references
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23. Thao, C.P., Kuo, D.H., Tuan, T.T.A., Tuan, K.A., Vu, N.H., Na, T.T.V.S., Nhut, K.V., and Sau, N.V. (2019). The effect of RF sputtering conditions on the physical characteristics of deposited GeGaN thin film. Coatings, 9.10.3390/coatings9100645 ↗
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