journal article·2023-03-20Open access

Cleaning Effect of Atmospheric-Plasma-Sprayed Y2O3 Coating Using Piranha Solution Based on Contamination Particle Measurement

Hyuksung Kwon, Minjoong Kim, Jongho So, Seonjeong Maeng, Jae-Soo Shin, Ju-Young Yun

Coatings· Volume 13· Issue 3

Abstract

A Y2O3 coating was prepared using the atmospheric plasma spraying (APS) technique. On exposing the coating to CF4/O2/Ar plasma, a fluorine contamination layer (YOxFy) was formed, which was the main cause of process drift and contamination particle generation on the APS–Y2O3 coating surface. To remove the YOxFy layer on the coating surface, a piranha solution, which is a mixture of sulfuric acid and hydrogen peroxide, was employed for cleaning. The piranha solution was found to be an excellent medium for removing the YOxFy layer. The amount of contamination particle generated could be reduced by approximately 37% after cleaning with a 3:1 piranha solution compared with before cleaning.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Diagnostics and Applications · Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Advanced Materials Engineering, Daejeon University, Daejeon 34520, Republic of Korea

Vacuum Materials Measurement Team, Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea

Department of Electrical Engineering, Hanyang University, Seoul 04763, Republic of Korea

Division of Nanoscience and Technology, University of Science and Technology, Daejeon 34113, Republic of Korea

Funding

Material parts technology development program of Ministry of Trade, Industry and Energy · Korea Research Institute of Standards and Science

References (24)

Show source-provided references
1. Plasma etching—A discussion of mechanisms10.1116/1.569958 ↗
2. Plasma etching: Yesterday, today, and tomorrow10.1116/1.4819316 ↗
3. Reduction of particle contamination in plasma-etching equipment by dehydration of chamber wall10.1143/JJAP.47.3630 ↗
4. Kasashima, Y., Nabeoka, N., Motomura, T., and Uesugi, F. (2014). Many flaked particles caused by impulsive force of electric field stress and effect of electrostriction stress in mass-production plasma etching equipment. Jpn. J. Appl. Phys., 53.10.7567/JJAP.53.040301 ↗
5. Mun, S.Y., Shin, K.C., Lee, S.S., Kwak, J.S., Jeong, J.Y., and Jeong, Y.H. (2005). Etch defect reduction using SF6/O2 plasma cleaning and optimizing etching recipe in photo resist masked gate poly silicon etch process. Jpn. J. Appl. Phys., 44.10.1143/JJAP.44.4891 ↗
6. So, J., Choi, E., Kim, J.-T., Shin, J.-S., Song, J.-B., Kim, M., Chung, C.-W., and Yun, J.-Y. (2020). Improvement of plasma resistance of anodic aluminum-oxide film in sulfuric acid containing Cerium(IV) ion. Coatings, 10.10.3390/coatings10020103 ↗
7. Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature10.1016/j.jmrt.2020.12.086 ↗
8. Song, J.-B., Kim, J.-T., Oh, S.-G., and Yun, J.-Y. (2019). Contamination particles and plasma etching behavior of atmospheric plasma sprayed Y2O3 and YF3 coatings under NF3 plasma. Coatings, 9.10.3390/coatings9020102 ↗
9. Contamination particle behavior of aerosol10.3390/coatings9050310 ↗
10. The effect of powder particle size on the corrosion behavior of atmospheric plasma spray-Y2O3 coating: Unraveling the corrosion mechanism by fluorine-based plasma10.1016/j.apsusc.2022.154958 ↗
11. Neutron diffraction residual strain measurements in alumina coatings deposited via APS and HVOF techniques10.1088/1742-6596/251/1/012051 ↗
12. Fragmentation behavior of Y2O3 suspension in axially fed suspension plasma spray10.1016/j.surfcoat.2016.11.021 ↗
13. Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization10.1016/j.surfcoat.2010.03.003 ↗
14. Fluorine Plasma Corrosion Resistance of Anodic Oxide Film Depending on Electrolyte Temperature10.5757/ASCT.2018.27.1.9 ↗
15. Plasma Corrosion in Oxalic Acid Anodized Coatings Depending on Tartaric Acid Content10.5757/ASCT.2016.25.1.15 ↗
16. A review on thermal spray coating processes
17. Effect of spray angle the on microstructure and mechanical properties of Y2O3 coating layer manufactured by atmospheric plasma spray process10.4150/KPMI.2021.28.4.310 ↗
18. Comparisons of NF3 plasma-cleaned Y2O3, YOF, and YF3 chamber coatings during silicon etching in Cl2 plasmas10.1116/1.5026777 ↗
19. Microstructure and plasma resistance of Y2O3 ceramics10.6111/JKCGCT.2014.24.6.268 ↗
20. A study on plasma corrosion resistance and cleaning process of yttrium-based materials using atmospheric plasma spray coating
21. Wet-cleaning of contaminants on the surface of multilayer dielectric pulse compressor gratings by the piranha solution
22. Cleaning and hydrophilization of atomic force microscopy silicon probes10.1021/jp063327g ↗
23. Effective cleaning process and its influence on surface roughness in anodic bonding for semiconductor device packaging10.1016/j.mssp.2014.11.002 ↗
24. Organic and inorganic contamination on commercial afm cantilevers10.1021/la990371x ↗