Growth of Magnetron-Sputtered Ultrathin Chromium Films: In Situ Monitoring and Ex Situ Film Properties
Source abstract
Abstract
We report a systematic nanoscale investigation on the ultrathin Cr film growth process and properties. Polycrystalline metallic films were manufactured by magnetron sputtering on fused silica substrates. The film growth was observed in situ by broad-band optical monitoring (BBM) and plasma-emission spectroscopy (OES) methods. The ex situ characterization of the Cr films with thicknesses varying from 2.6 nm up to 57 nm were performed by both non-destructive and destructive techniques. Recently, we reported on a novel set of data for optical and electrical properties of sputtered chromium films. The optical and electrical properties of the films are known to be governed by their structure and microstructure, which were analyzed in detail in the present research. Moreover, the optical properties of the films were studied here in a significantly wider optical range and obtained using both in situ and ex situ measurements. Reliable in situ nanoscale characterization of metal films was shown to ensure an unfailing approach in obtaining ultrathin layers with desirable thickness and stable and well-determined optical constants and electrical conductivity. This is of high importance for various industries and novel upcoming applications.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Surface and Thin Film Phenomena · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Center for Physical Sciences and Technology, 02300 Vilnius, Lithuania
Optical Coatings Group, ENEA Casaccia, 00123 Roma, Italy
Department of Electronic Systems, VILNIUS TECH, 10223 Vilnius, Lithuania
Funding
European Social Fund · Research Council of Lithuania
References (47)
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1. Ding, Y., Zhang, F., Yan, S., Li, H., He, J., and Yin, F. (2019). Microstructure, Micro-Indentation, and Scratch Behavior of Cr Films Prepared on Al alloys by Using Magnetron Sputtering. Metals, 9.10.3390/met9121330 ↗
2. Lozanova, V., Lalova, A., Soserov, L., and Todorov, R. (2014). Optical and electrical properties of very thin chromium films for optoelectronic devices. J. Phys. Conf. Ser., 514.10.1088/1742-6596/514/1/012003 ↗
3. Ultrathin chromium transparent metal contacts by pulsed dc magnetron sputtering10.1002/pssa.200983732 ↗
4. Surface plasmon–polariton waves guided by thin metal films10.1364/OL.16.000720 ↗
5. Description of dispersion properties of metals by means of the critical points model and application to the study of resonant structures using the FDTD method10.1088/0022-3727/40/22/043 ↗
6. Lithium permeation within lithium niobate multilayers with ultrathin chromium, silicon and carbon spacer layers10.1039/C8CP03345E ↗
7. Norkus, M., and Skaudžius, R. (2022). Enhanced NIR Region Emission of Chromium by Changing the Chromium Concentration in Yttrium Aluminum Garnet (YAG) Host Matrix. J. Alloys Compd., 908.10.1016/j.jallcom.2022.164601 ↗
8. Electrochromic performance of chromium-doped Co3O4 nanocrystalline thin films prepared by nebulizer spray technique10.1016/j.jallcom.2018.12.385 ↗
9. Patterson, D. (CA,, January San). Very Simple Data Processing System for Deep Submicron Nanofabrication. Proceedings of the Electron-Beam, X-ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, SPIE’s, 1994, Symposium on Microlitography, 27 February–4 March 1994.
10. Bloch, E., Mistele, D., Brener, R., Cytermann, C., Gavrilov, A., and Ritter, D. (2011). NiCr thin film resistor integration with InP technology. Semicond. Sci. Technol., 26.10.1088/0268-1242/26/10/105004 ↗
11. Crystallographic orientation of sputtered Cr films on glass and glass–ceramic substrates10.1016/S0040-6090(96)09206-1 ↗
12. Growth morphology and corrosion resistance of magnetron sputtered Cr films10.1016/j.surfcoat.2011.09.020 ↗
13. Kashkarov, E., Sidelev, D., Rombaeva, M., Syrtanov, M., and Bleykher, G. (2020). Chromium coatings deposited by cooled and hot target magnetron sputtering for accident tolerant nuclear fuel claddings. Surf. Coatings Technol., 389.10.1016/j.surfcoat.2020.125618 ↗
14. Design and fabrication of metameric interference thin films based on metal-dielectric structure for optical security devices10.1016/j.surfcoat.2019.02.031 ↗
15. Discovery, properties and applications of chromium and its compounds10.1007/s40828-015-0007-z ↗
16. Wang, Z.-Y., Hu, E.-T., Cai, Q.-Y., Wang, J., Tu, H.-T., Yu, K.-H., Chen, L.-Y., and Wei, W. (2020). Accurate Design of Solar Selective Absorber Based on Measured Optical Constants of Nano-thin Cr Film. Coatings, 10.10.3390/coatings10100938 ↗
17. Rahimi, H., Karimi, M., and Ghajarpour-Nobandegani, S. (2021). Chromium nanostructures for enhancing light trapping in a thin-film solar cell. Opt. Mater., 121.10.1016/j.optmat.2021.111548 ↗
18. Characterization of chromium thin films by sputter deposition10.1016/j.jallcom.2011.08.052 ↗
19. Ferreira, A.A., Silva, F.J.G., Pinto, A.G., and Sousa, V.F.C. (2021). Characterization of Thin Chromium Coatings Produced by PVD Sputtering for Optical Applications. Coatings, 11.10.3390/coatings11020215 ↗
20. Control of optical transmission through metals perforated with subwavelength hole arrays10.1364/OL.24.000256 ↗
21. Mroczyński, R., Iwanicki, D., Fetliński, B., Ożga, M., Świniarski, M., Gertych, A., Zdrojek, M., and Godlewski, M. (2020). Optimization of Ultra-Thin Pulsed-DC Magnetron Sputtered Aluminum Films for the Technology of Hyperbolic Metamaterials. Crystals, 10.10.3390/cryst10050384 ↗
22. Grilli, M.L., Vernhes, R., Hu, G., Di Sarcina, I., Dikonimos, T., Sytchkova, A., Martinu, L., He, H., and Piegari, A. (2019). Characteristics of Ultrathin Ni Films. Phys. Status Solidi, 216.10.1002/pssa.201800728 ↗
23. Cortazar-Martínez, O., Torres-Ochoa, J.-A., Raboño-Borbolla, J.-G., and Herrera-Gomez, A. (2021). Oxidation mechanism of metallic chromium at room temperature. Appl. Surf. Sci., 542.10.1016/j.apsusc.2020.148636 ↗
24. Recent aspects concerning DC reactive magnetron sputtering of thin films: A review10.1016/S0257-8972(00)00566-1 ↗
25. Reactive magnetron sputtering of thin films: Present status and trends10.1016/j.tsf.2004.07.041 ↗
26. Anders, A. (2017). Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS). J. Appl. Phys., 121.10.1063/1.4978350 ↗
27. Tracing the recorded history of thin-film sputter deposition: From the 1800s to 201710.1116/1.4998940 ↗
28. Sytchkova, A., Belosludtsev, A., Volosevičienė, L., Juškėnas, R., and Simniškis, R. (2021). Structural, optical and electrical properties of sputtered ultrathin chromium films. Opt. Mater., 121.10.1016/j.optmat.2021.111530 ↗
29. Wu, W.-Y., Hsiao, B.-H., Chen, P.-H., Chen, W.-C., Ho, C.-T., and Chang, C.-L. (2014). CrNx films prepared using feedback-controlled high power impulse magnetron sputter deposition. J. Vac. Sci. Technol. A Vac. Surf. Film., 32.10.1116/1.4862147 ↗
30. Extraction and Flame Spectrophotometric Determination of Chromium10.1021/ac60129a013 ↗
31. Šlapanská, M., Hecimovic, A., Gudmundsson, J.T., Hnilica, J., Breilmann, W., Vašina, P., and von Keudell, A. (2020). Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge. J. Phys. D Appl. Phys., 53.10.1088/1361-6463/ab6a8c ↗
32. Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS10.1016/j.surfcoat.2017.10.006 ↗
33. Real Time Cr Measurement Using Optical Emission Spectroscopy During Direct Metal Deposition Process10.1109/JSEN.2011.2162316 ↗
34. magnetron sputtering of oxidation-resistant chromium and CrN films monitored by optical emission spectrometry10.1016/0921-5093(91)90606-N ↗
35. Siepa, S., Danko, S., Tsankov, T.V., Mussenbrock, T., and Czarnetzki, U. (2014). On the OES line-ratio technique in argon and argon-containing plasmas. J. Phys. D Appl. Phys., 47.10.1088/0022-3727/47/44/445201 ↗
36. Thin film characterisation of chromium disilicide10.1016/j.susc.2012.11.018 ↗
37. Flexible hydrophobic ZrN nitride films10.1016/j.vacuum.2016.05.020 ↗
38. Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition10.1016/j.ceramint.2017.01.102 ↗
39. Houska, J., and Kozak, T. (2020). Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxides. Surf. Coatings Technol., 392.10.1016/j.surfcoat.2020.125685 ↗
40. Review of the fundamentals of thin-film growth10.1364/AO.41.003053 ↗
41. Lovrinčić, R., and Pucci, A. (2009). Infrared optical properties of chromium nanoscale films with a phase transition. Phys. Rev. B, 80.10.1103/PhysRevB.80.205404 ↗
42. Real-time in-situ investigation of copper ultrathin films growth10.1016/j.matlet.2018.08.127 ↗
43. Belosludtsev, A., Sytchkova, A., Kyžas, N., Bitinaitis, I., Simniškis, R., and Drazdys, R. (2021). Comparison of in-situ investigation of silver ultrathin films growth with the ex-situ resistance and ellipsometric measure-ments. Vacuum, 195.10.1016/j.vacuum.2021.110669 ↗
44. Kar, C., Jena, S., Udupa, D.V., and Rao, K.D. (2023). Tamm plasmon polariton in planar structures: A brief overview and applications. Opt. Laser Technol., 159.10.1016/j.optlastec.2022.108928 ↗
45. Broadband Tamm plasmon polariton10.1364/JOSAB.36.002299 ↗
46. Structural, Optical and Electrical Properties of Chromium Thin Films Prepared by Magnetron Sputtering10.3788/gzxb20124108.0922 ↗
47. Impact of substrates on the electrical properties of thin chromium films