journal article·2023-11-05Open access

Electrocrystallization and Morphology of Copper Coatings in the Presence of Organic Additives

Oleg Kozaderov, Nadezhda Sotskaya, Ludmila Yudenkova, Nikita Buylov, Evgeniia Ilina

Coatings· Volume 13· Issue 11

Abstract

Copper coatings with refined grains and smooth surface morphology were electrodeposited from electrolytes comprising a novel accelerator, the disodium salt of 4,4-dithiobenzene disulfonic acid (DBDA), with sodium chloride and polyethylene glycol (PEG) as inhibitors and 2-aminobenzothiazole (ABT) as a leveler. It was found that the morphology of the coatings strongly depends on the presence and type of additives. In the presence of only DBDA and NaCl, large crystallites are formed, whereas the addition of PEG and ABT significantly decreases their size, and the most fine-grained, smooth, and defect-free copper coating is formed with the combined use of all additives. To establish the correlation between the observed morphology and the kinetics of the additive-assisted copper electrocrystallization in the proposed electrolytes, the nucleation mechanism and its parameters were determined by transient electrochemical characterization. The extended nucleation model, which takes into account not only the copper deposition but also the electric double-layer charging and hydrogen reduction process, was used to establish the electrocrystallization kinetics in the presence of the additives. The results of such kinetic analyses can help to explain the morphological effect. By using the chronopotentiometry method, it was found that the addition of the disodium salt of 4,4-dithiobenzene disulfonic acid with chloride ions gives a catalytic effect, while the sequential introduction of polyethylene glycol and 2-aminobenzothiazole provides an increasing inhibitory effect. Voltamperometry and chronoamperometry tests showed that the process is controlled by the diffusion of ions to the growing three-dimensional cluster of a new phase. The introduction of additives into the electrolyte slows down the copper electroplating process at comparatively negative potentials and increases the probability of transition from instantaneous to progressive nucleation. Moreover, the rate of the process and the density of nucleation active sites increase (up to 2–3 times) with the addition of DBDA but decrease significantly (up to 5–8 times) in the presence of PEG and ABT, which additionally confirms their catalytic and inhibitory effects, respectively, and explains the significant smoothing effect on the morphology of the Cu-coatings.
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Corrosion Behavior and Inhibition · Copper Interconnects and Reliability

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Organic Additives for the Processes of Chemical and Electrochemical Deposition of Metals and Alloys Used in the Electronics Industry, Voronezh State University, University Sq. 1, 394018 Voronezh, Russia

Department of Physical Chemistry, Faculty of Chemistry, Voronezh State University, University Sq. 1, 394018 Voronezh, Russia

Funding

Ministry of Science and Higher Education of the Russian Federation

References (57)

Show source-provided references
1. Electroplating: Applications in the semiconductor industry10.4236/aces.2019.92018 ↗
2. Understanding the barrier layer formed via adding BTAH in copper film electrodeposition10.1149/2.0041902jes ↗
3. Effect of cetyl-trimethyl-ammonium-bromide (CTAB) and bis (3-sulfopropyl) disulfide (SPS) on the through-silicon-via (TSV) copper filling10.1016/j.mee.2019.111109 ↗
4. Additive Behavior during copper electrodeposition in solutions containing Cl− , PEG, and SPS10.1149/1.1570412 ↗
5. Copper electrodeposition from an acidic plating bath containing accelerating and inhibiting organic additives10.1016/j.electacta.2008.03.073 ↗
6. The synergistic effects of additives on the micro vias copper filling10.1016/j.jelechem.2022.116456 ↗
7. Filling mechanism in microvia metallization by copper electroplating10.1016/j.electacta.2008.06.042 ↗
8. Sonochemical electrodeposition of copper coatings10.1134/S1070427218020064 ↗
9. Electrodeposited copper using direct and pulse currents from electrolytes containing low concentration of additives10.1016/j.surfcoat.2018.01.067 ↗
10. Role of additives for copper damascene electrodeposition: Experimental study on inhibition and acceleration effects10.1149/1.1649235 ↗
11. Investigation of PEG adsorption on copper in Cu2+-free solution by SERS and AFM10.1016/j.electacta.2012.06.039 ↗
12. Adsorption of gelatin during electrodeposition of copper and tin–copper alloys from acid sulfate electrolyte10.1016/j.surfcoat.2014.04.050 ↗
13. Synergistic effects of gelatin and convection on copper foil electrodeposition10.1016/j.electacta.2016.06.051 ↗
14. Copper electrodeposition in sulphate solutions in the presence of benzotriazole10.1007/s10800-005-9000-3 ↗
15. Investigation of copper deposition in the presence of benzotriazole10.1016/S0040-6090(02)00529-1 ↗
16. Effect of additives and pulse plating on copper nucleation onto Ru10.1016/j.electacta.2008.08.065 ↗
17. Nicotinic acid as brightener agent in copper electrodeposition10.1016/S0022-0728(00)00412-5 ↗
18. Hydroquinone oriented growth control to achieve high-quality copper coating at high rate for electronics interconnection10.1016/j.jtice.2020.07.004 ↗
19. Saberi, A., Bakhsheshi-Rad, H.R., Abazari, S., Ismail, A.F., Sharif, S., Ramakrishna, S., Daroonparvar, M., and Berto, F. (2021). A Comprehensive review on surface modifications of biodegradable magnesium-based implant alloy: Polymer coatings opportunities and challenges. Coatings, 11.10.3390/coatings11070747 ↗
20. Use of polyethylene glycol as organic additive in copper electrodeposition over stainless steel cathodes
21. Copper deposition in the presence of polyethylene glycol I. Quartz crystal microbalance study10.1149/1.1838829 ↗
22. Chloride adsorption on Cu(111) electrodes in dilute HCl solutions10.1016/S0039-6028(96)01461-6 ↗
23. Effects of polyethylene glycol on the electrochemical characteristics of copper cathodes in an acid copper medium
24. Microvia filling by Cu electroplating over a Au seed layer modified by a disulfide10.1149/1.3078407 ↗
25. Effect of thiourea, benzotriazole and 4,5-dithiaoctane-1,8-disulphonic acid on the kinetics of copper deposition from dilute acid sulphate solutions10.1007/BF00573215 ↗
26. Vibrational spectroscopic and mass spectrometric studies of the interaction of bis(3-sulfopropyl)-disulfide with Cu surfaces10.1149/1.2139952 ↗
27. 3-Mercapto-1-propanesulfonate for Cu electrodeposition studied by in situ shell-isolated nanoparticle-enhanced raman spectroscopy, density functional theory calculations, and cyclic voltammetry10.1021/acs.jpcc.5b06274 ↗
28. Novel 2,5-bis(6-(trimethylamonium)hexyl)-3,6-diaryl-1,4-diketopyrrolo[3,4-c] pyrrole pigments as levelers for efficient electroplating applications10.1016/j.dyepig.2020.109064 ↗
29. Investigation of novel leveler Rhodamine B on copper superconformal electrodeposition of microvias by theoretical and experimental studies
30. Kinetic and morphological investigation of copper electrodeposition from sulfate electrolytes in the presence of an additive based on ethoxyacetic alcohol and triethyl-benzyl-ammonium chloride10.1016/S0254-0584(01)00326-1 ↗
31. Effect of chloride electrolyte additive on the quality of electrorefined copper cathode10.1016/j.promfg.2019.06.024 ↗
32. Comparative study of copper electrodeposition from sulphate acidic electrolytes in the presence of IT-85 and of its components10.1007/s10800-004-2398-1 ↗
33. Effects of additives in an electrodeposition bath on the surface morphologic evolution of electrodeposited copper10.20964/2021.02.40 ↗
34. The influence of leveler brilliant green on copper superconformal electroplating based on electrochemical and theoretical study
35. Revealing the acceleration effect of SPS and Cl− on copper surface: Instantaneous nucleation and multi-step energy change10.1016/j.apsusc.2022.152523 ↗
36. Synergistic effect of additives on electrodeposition of copper from cyanide-free electrolytes and its structural and morphological characteristics10.1016/S1003-6326(17)60189-4 ↗
37. Acceleration kinetics of PEG, PPG, and a triblock copolymer by SPS during copper electroplating10.1149/1.3078405 ↗
38. Electrodeposition of Cu in the PEI-PEG-Cl-SPS additive system reduction of overfill bump formation during superfilling10.1149/1.2216356 ↗
39. Electronucleation mechanism of copper in wastewater by controlled electrodeposition analysis10.1039/D0RA07380F ↗
40. Fabbri, L., Giurlani, W., Mencherini, G., De Luca, A., Passaponti, M., Piciollo, E., Fontanesi, C., and Caneschi, A. (2022). Optimisation of thiourea concentration in a decorative copper plating acid bath based on methanesulfonic electrolyte. Coatings, 12.10.3390/coatings12030376 ↗
41. The electrochemical nucleation of copper on disc-shaped ultramicroelectrode in industrial electrolyte10.1016/j.electacta.2008.06.055 ↗
42. Influence of organic additives on the initial stages of copper electrodeposition on polycrystalline platinum10.1016/j.electacta.2008.09.052 ↗
43. Initial stages of copper electrodeposition in the presence of organic additives10.1016/0013-4686(93)85116-G ↗
44. Structural effect of inhibitors on adsorption and desorption behaviors during copper electroplating for through-silicon vias10.1016/j.electacta.2021.137907 ↗
45. Extreme bottom-up superfilling of through-silicon-vias by damascene processing: Suppressor disruption, positive feedback and turing patterns10.1149/2.040204jes ↗
46. Galvanostatic plating with a single additive electrolyte for bottom-up filling of copper in mesoscale TSVs10.1149/2.0271901jes ↗
47. Superconformal copper deposition in through silicon vias by suppression-breakdown10.1149/2.0061802jes ↗
48. Copper deep via filling with selective accelerator deactivation by a reverse pulse10.1149/1.3499612 ↗
49. High-speed through silicon via (TSV) filling using diallylamine additive10.1149/2.076112jes ↗
50. Effect of organic additives on the filling of blind vias in the manufacture of electronic devices
51. Role of SPS in chloride ions and PEG additive system for copper electrocrystallisation10.1179/174591910X12692576434572 ↗
52. Effect of polymer additive on structural and morphological properties of Cu-electrodeposition from an acid sulfate electrolyte: Experimental and theoretical studies10.1016/j.jelechem.2023.117722 ↗
53. The effect of quaternary ammonium-based ionic liquids on copper electrodeposition from acidic sulfate electrolyte10.1007/s10800-014-0774-z ↗
54. Theoretical and experimental studies of multiple nucleation10.1016/0013-4686(83)85163-9 ↗
55. Overpotential nucleation and growth of copper onto polycrystalline and single crystal gold electrodes10.1016/S1452-3981(23)13938-1 ↗
56. The Impact of Organic Additives on Copper Trench Microstructure10.1149/2.1131707jes ↗
57. Pletcher, D., Tian, Z.-Q., and Williams, D.E. (2014). Developments in Electrochemistry: Science Inspired by Martin Fleischmann Chapter: 4, John Wiley & Sons, Ltd.10.1002/9781118694404 ↗