Effect of Tantalum Addition on Properties of Cu–Zr–Based Thin Film Metallic Glasses (TFMGs)
Source abstract
Abstract
Cu–Zr–Ta ternary thin film metallic glasses (TFMGs) were deposited through the direct current (DC) magnetron sputtering of pure metallic targets in a dynamic mode. The effect of tantalum addition on the microstructure, mechanical properties, and thermal behavior of TFMGs were investigated. Nanoindentation measurements showed that an increase in tantalum content from 0 to 47 at % favored hardness and Young’s modulus, which rose from 5.8 to 11.23 Gpa and from 90 to 136 Gpa, respectively. XRD analysis and differential scanning calorimetry (DSC) measurements highlighted an improvement of thermal stability with the tantalum addition from 377 to 582 °C when the tantalum content increased from 0 to 31 at %.
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Research context
OpenAlex topics: Metallic Glasses and Amorphous Alloys · Electrodeposition and Electroless Coatings · Electromagnetic wave absorption materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
ICD-LASMIS: Université de Technologie de Troyes, CNRS, Antenne de Nogent, Pôle Technologique de Sud Champagne, 26 Rue Lavoisier, 52800 Nogent, France
Nogent International Center for CVD Innovation, LRC CEA-ICD-LASMIS, UTT, Antenne de Nogent-52, Pôle Technologique de Haute-Champagne, 52800 Nogent, France
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