Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings
Source abstract
Abstract
Monolithic Hf–Si–N coatings and multilayered Hf–Si–N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf–Si–N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf48Si3N49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young’s modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15–16 GPa; this hardness is close to that of Si3N4. Various oxides were formed after annealing of the Hf–Si–N coatings at 600 °C in a 1% O2–99% Ar atmosphere. Monoclinic HfO2 formed after Hf54N46 annealing and amorphous oxide formed for the oxidation-resistant Hf32Si19N49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Engineering, Ming Chi University of Technology, New Taipei 24301, Taiwan
Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei 24301, Taiwan
Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
Funding
Ministry of Science and Technology, Taiwan
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