Fabrication of Superhydrophobic and UV-Resistant Silk Fabrics with Laundering Durability and Chemical Stabilities
Source abstract
Abstract
To obtain a superhydrophobic surface, SiO2 nanoparticles are deposited on the surface of silk fabric (SF) by Plasma Enhanced Chemical Vapor Deposition (PECVD) to form a hierarchical roughness structure. In addition, a durable superhydrophobic SiO2@silk fabric was further prepared by hexamethyldisilazane (HMDS) modification. Compared with bare silk, the surfaces of the SiO2@silk fabric exhibit higher surface roughness and excellent superhydrophobic activity, with a contact angle (CA) of ~152°. The excellent UV resistance of SiO2@silk fabric was confirmed with high UV protection factor (UPF) values and a low UV transmittance. Moreover, both the laundering durability and chemical stability of the SiO2@silk fabric were improved. Overall, this method is recognized as a promising approach to produce high-end fabric development. It can also guide the design of multifunctional fiber materials in the future.
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Research context
OpenAlex topics: Surface Modification and Superhydrophobicity · Silk-based biomaterials and applications · Advanced Sensor and Energy Harvesting Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials, Ministry of Education Key Laboratory for the Green Preparation and Application of Functional Materials, School of Materials Science and Engineering, Hubei University, Wuhan 430062, China
Funding
the key projects of Department of Hubei Provincial Science and Technology · Natural Science Foundation of Hubei Province · National Natural Science Foundation of China
References (23)
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