Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon
Source abstract
Abstract
Modification of vacuum chamber surface properties by introducing a layer of material with low secondary electron yield (SEY) is one of the most useful solutions to suppress the electron-cloud in high-energy particle accelerators. In the present work, amorphous carbon thin films have been produced by DC magnetron sputtering with Neon and Argon sputtering gases. Microstructures of the thin films have been characterized by using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The sp2 and sp3 hybridized carbon atoms are evaluated using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The amorphous carbon coatings comprise tiny granularities of tens of nanometers. The amorphous carbon films show more graphite-like properties as revealed by XPS and Raman spectroscopy. The secondary electron emission measurement results indicate that amorphous carbon coatings present SEY of <1.2. The thin film deposited by Ne exhibits a higher sp2 hybridization content, leading to a slightly lower SEY compared with the film produced with Ar.
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Ion-surface interactions and analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
Funding
National Natural Science Foundation of China
References (42)
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