Absolute Absorption Measurements in Optical Coatings by Laser Induced Deflection
Source abstract
Abstract
Absolute measurement of residual absorption in optical coatings is steadily becoming more important in thin film characterization, in particular with respect to high power laser applications. A summary is given on the current ability of the laser induced deflection (LID) technique to serve sensitive photo-thermal absorption measurements combined with reliable absolute calibration based on an electrical heater approach. To account for different measurement requirements, several concepts have been derived to accordingly adapt the original LID concept. Experimental results are presented for prominent UV and deep UV laser wavelengths, covering a variety of factors that critically can influence the absorption properties in optical coatings e.g., deposition process, defects and impurities, intense laser irradiation and surface/interface engineering. The experimental findings demonstrate that by combining high sensitivity with absolute calibration, photo-thermal absorption measurements are able to be a valuable supplement for the characterization of optical thin films and coatings.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Laser Material Processing Techniques · Surface Roughness and Optical Measurements · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Microscopy, Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany
Funding
Bundesministerium für Forschung und Technologie
References (31)
Show source-provided references
1. Combined laser calorimetry and photothermal technique for absorption measurement of optical coatings10.1364/AO.45.005827 ↗
2. Light-induced absorption in materials studied by photothermal methods10.2174/187221209788462517 ↗
3. Photothermal common-path interferometry (PCI): New developments10.1117/12.814813 ↗
4. Method for measuring small optical absorption coefficients with use of a Shack–Hartmann wave-front detector10.1364/AO.42.004835 ↗
5. Photoacustic absorption spectrometer for highly transparent dielectrics with parts-per-million sensitivity10.1063/1.4792724 ↗
6. A Novel method to measure bulk absorption in optically transparent materials10.1063/1.1150441 ↗
7. Characterization of low losses in optical thin films and materials10.1364/AO.47.00C135 ↗
8. Laser induced deflection technique for absolute thin film absorption measurement: Optimized concepts and experimental results10.1364/AO.50.00C449 ↗
9. Sensitive and absolute absorption measurements in optical materials and coatings by laser induced deflection (LID) technique
10. Enhanced laser-induced deflection measurements for low absorbing highly reflecting mirrors10.1364/AO.53.000A16 ↗
11. Mühlig, C., Bublitz, S., and Paa, W. (2012, January 23–26). Sandwich concept: Enhancement for direct absorption measurements by laser induced deflection (LID) technique. Proceedings of the Laser-Induced Damage in Optical Materials, Boulder, CO, USA.10.1117/12.976853 ↗
12. Deep UV laser induced luminescence in oxide thin films10.1007/s00339-002-1446-0 ↗
13. Optical properties of oxygen vacancies in HfO2 thin films studied by absorption and luminescence spectroscopy10.1364/OE.26.017608 ↗
14. Cathodo-and photoluminescence increase in amorphous hafnium oxide under annealing in oxygen10.1134/S1063776115020132 ↗
15. Optical properties of magnesium fluoride thin films produced by argon ion-beam assisted deposition10.1116/1.1424276 ↗
16. Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al10.1016/S0030-4018(02)02229-0 ↗
17. Deep UV laser induced luminescence in fluoride thin films10.1007/s00339-002-1502-9 ↗
18. Mühlig, C., Triebel, W., Kufert, S., and Bublitz, S. (2008, January 2–5). Laser induced fluorescence and absorption measurements for DUV optical thin film characterization. Proceedings of the Advances in Optical Thin Films III, Scotland, UK.10.1117/12.797676 ↗
19. Absorption and fluorescence measurements in optical coatings10.1007/978-3-319-75325-6_15 ↗
20. Generation and annealing of defects in virgin fused silica (type III) upon ArF laser irradiation: Transmission measurements and kinetic model10.1016/j.jnoncrysol.2007.07.019 ↗
21. Optical and structural properties of LaF3 thin films10.1364/AO.47.00C157 ↗
22. Nonlinear absorption of thin Al2O3 films at 193 nm10.1364/AO.39.003165 ↗
23. Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens10.1016/j.optcom.2004.09.018 ↗
24. Role of two-photon absorption in Ta2O5 thin films in nanosecond laser-induced damage
25. Nonlinear absorption in single LaF3 and MgF2 layers at 193 nm measured by surface sensitive laser induced deflection technique10.1364/AO.48.006781 ↗
26. Film structure and optical constants of magnetron-sputtered fluoridic films for deep ultraviolet lithography10.1016/j.vacuum.2004.01.009 ↗
27. High-reflectance 193 nm Al2O3/MgF2 mirrors10.1016/j.apsusc.2004.11.076 ↗
28. Görling, C. (2003). Wechselwirkungsmechanismen Von DUV- und VUV-Laserstrahlung Mit Fluoridischen Einkristallen. [Ph.D. Thesis, Georg-August-University].
29. Two-photon absorption at 248 nm in ultraviolet window materials10.1364/OL.13.000814 ↗
30. Intensity-dependent transmission properties of window materials at 193 nm irradiation10.1364/OL.19.002053 ↗
31. Influence of Na-related defects on ArF laser absorption in CaF210.1007/s00340-010-3959-0 ↗