Numerical Simulation Applied to PVD Reactors: An Overview
Source abstract
Abstract
The technological evolution in the last century also required an evolution of materials and coatings. Therefore, it was necessary to make mechanical components subject to heavy wear more reliable, improving their mechanical strength and durability. Surfaces can contribute decisively to extending the lifespan of mechanical components. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) technologies have emerged to meet the new requirements that have enabled a remarkable improvement in the morphology, composition and structure of films as well as an improved adhesion to the substrate allowing a greater number of diversified applications. Thin films deposition using PVD coatings has been contributing to tribological improvement, protecting their surfaces from wear and corrosion, as well as enhancing their appearance. This process can be an advantage over other processes due to their excellent properties and environmental friendly behavior, which gives rise to a large number of studies in mathematical modelling and numerical simulation, like finite element method (FEM) and computational fluid dynamics (CFD). This review intends to contribute to a better PVD process knowledge, in the fluids and heat area, using CFD simulation methods focusing on the process energy efficiency improvement regarding the industrial context with the sputtering technique.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · High-Temperature Coating Behaviors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
UVIGO—School of Industrial Engineering, University of Vigo, Lagoas-Marcosende, 36310 Vigo-Pontevedra, Spain
ISEP—School of Engineering, Polytechnic of Porto, 4200-072 Porto, Portugal
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