Optimization Studies of Photocatalytic Tungsten-Doped Titania Coatings Deposited by Reactive Magnetron Co-Sputtering

In this article we investigate the structural and photocatalytic properties of W-doped titanium dioxide coatings. TiO2-W thin films were deposited onto glass slides by reactive magnetron co-sputtering. The properties of the films were analyzed using such techniques as XRD, Raman spectroscopy, EDX, TEM, and surface profilometry. The photocatalytic properties of the coatings were assessed using the methylene blue (MB) degradation test under UV and fluorescent light sources. The methylene blue decomposition experiments showed that, at the optimum dopant concentration of tungsten, the photocatalytic activity can be improved by a factor of 6, compared to undoped titania. For the coatings discussed within this work, the optimum dopant concentration was determined to be 5.89 at.% of W. The results indicated that tungsten doping at this level extends the lifetime of the photogenerated charge carriers and significantly increases the photocatalyst surface area.