Review on Tribological and Corrosion Properties of Amorphous Silicon-Based Coatings Fabricated by Chemical Vapor Deposition
Source abstract
Abstract
Chemical vapor deposition (CVD) is a crucial technique for fabricating high-performance amorphous silicon coatings, leveraging its process flexibility and microstructural controllability. Optimizing processes like hot-wire chemical vapor deposition, plasma-enhanced chemical vapor deposition, and catalytic chemical vapor deposition enable precise regulation of coating density, surface roughness, and chemical bonding. These amorphous silicon coatings exhibit outstanding tribological properties and exceptional corrosion resistance, primarily attributed to their unique amorphous structure eliminating grain boundary defects and forming dense passivation films. Future research should focus on intelligent process development, multi-field coupling failure analysis, environmental friendliness enhancement, and lifespan prediction models to advance this technology.
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · High-Temperature Coating Behaviors · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Intelligent Manufacturing and Control Engineering, Shanghai Polytechnic University, Shanghai 201209, China
Vocational and Technical Teacher Education School, Shanghai Polytechnic University, Shanghai 201209, China
Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996, USA
References (100+)
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