Electrodeposition of Metallic Tungsten Coating on 9Cr-ODS Steel Substrate from Binary Oxide Molten Salt

Characteristics of electrodeposited tungsten coatings prepared at 1193 K and varying current density were investigated. The crystal structure and microstructure of tungsten coatings were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoelectron spectroscopy (XPS). The results indicated that pulsed current density significantly influence the tungsten nucleation and electro-crystallization phenomena. The average grain size of the coating becomes larger with increasing current density, which demonstrates that appropriate high cathodic current density can accelerate the growth of grains on the surface of the substrate. The micro-hardness of tungsten coatings increases with increasing thickness and then slightly decreases; the maximum micro-hardness is 589.55 HV, with the oxygen content remaining below 0.03 wt%.