Optimization of Gold Thin Films by DC Magnetron Sputtering: Structure, Morphology, and Conductivity
Source abstract
Abstract
Gold thin films were deposited on quartz substrates by DC magnetron sputtering to fabricate electrodes for electrochemical and resistive sensing applications. The influence of sputtering parameters on film thickness, structure, and electrical properties was systematically investigated. XRD analysis revealed a predominant (111) crystallographic orientation. Microstrain values, determined via Williamson–Hall (W–H) analysis, were low (below 0.013) and closely correlated with surface roughness trends. AFM measurements showed that the surface roughness increased with film thickness. Electrical resistivity decreased linearly with increasing thickness and exhibited a critical grain size of approximately 25 nm, beyond which conductivity improved markedly. These results demonstrate the strong dependence of Au thin-film morphology and performance on deposition conditions, offering practical guidelines for optimizing their application in functional sensing devices.
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Research context
OpenAlex topics: Semiconductor materials and devices · Gas Sensing Nanomaterials and Sensors · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
CBRTP SA Research and Development Center of Technology for Industry, Ludwika Waryńskiego 3A, 00-645 Warszawa, Poland
Faculty of Non-Ferrous Metals, AGH University of Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
Funding
Research University of AGH University of Krakow
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