Dielectric Coating Deposition Regimes during Electron-Beam Evaporation of Ceramics in the Fore-Vacuum Pressure Range
Source abstract
Abstract
We present experimental results on the deposition of dielectric coatings on metal surfaces by electron-beam evaporation of alumina ceramics in nitrogen and oxygen gas medium at the pressures of 5–30 Pa. The feasibility of implementing this approach is associated with the use of unique fore-vacuum plasma electron sources. The effect of electron beam power on the rates of ceramic target evaporation and, consequently, on the coating deposition rate is investigated. The structure, electrical-insulating and mechanical (wear resistance, adhesion) properties of the deposited coatings is investigated. We also show the possibility of using coatings for electrical insulating of wires and monolithic integrated circuits.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · High-Temperature Coating Behaviors · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics, Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., 634050 Tomsk, Russia
Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., 634055 Tomsk, Russia
Funding
Russian Science Foundation · Russian Foundation for Basic Research
References (31)
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