journal article·2020-07-19Open access

Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach

Koumei Baba, Ruriko Hatada, Stefan Flege, Wolfgang Ensinger

Coatings· Volume 10· Issue 7

Abstract

Amorphous carbon films with a high hardness usually suffer from high internal stress. To deposit films with a hard top surface but reduced internal stress, a simple bilayer approach was used. Films were prepared by plasma source ion implantation, using only hydrocarbon precursors. The single layer with the highest hardness (deposited by a low direct current (DC) voltage and radio frequency (RF) generation of the plasma) has the highest internal stress with more than 3.5 GPa. By adding an interlayer with a lower hardness, the resulting stress of the bilayer film can be reduced to below 1.4 GPa while maintaining the high hardness of the top layer. By avoiding metallic interlayers or dopants within the films, the deposition process can be kept simple and cost-effective, and it is also suitable for three-dimensional samples.
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Research context

OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Lubricants and Their Additives

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

SANNO Co., Ltd., Yokohama 223-0052, Japan

Department of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt, Germany

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