Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering
Source abstract
Abstract
Nickel films of 4–250 nm thickness were produced by DC magnetron sputtering onto glass and silicon substrates. The electrical properties of the films were investigated by the four-probe method and the surface morphology of the films was studied by atomic force microscopy. To measure the shielding effectiveness, a portable closed stand based on horn antennas was used. A theoretical assessment of the shielding effectiveness of nickel films of various thickness under electromagnetic radiation of a range of frequencies was carried out using two different approximations. The results demonstrate the shielding effectiveness of up to 35 dB of the nickel thin films in the frequency range of 2–18 GHz.
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Research context
OpenAlex topics: Electromagnetic wave absorption materials · Electromagnetic Compatibility and Measurements · Advanced Antenna and Metasurface Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Engineering Centre for Microtechnology and Diagnostics, Saint Petersburg Electrotechnical University “LETI”, 197376 Saint Petersburg, Russia
Department of Physical Electronics and Technology, Saint Petersburg Electrotechnical University “LETI”, 197376 Saint Petersburg, Russia
Department of Micro and Nanoelectronics, Saint Petersburg Electrotechnical University “LETI”, 197376 Saint Petersburg, Russia
Funding
Russian Science Foundation
References (44)
Show source-provided references
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