Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology
Source abstract
Abstract
Diamond coating using hot-filament chemical vapor deposition (HFCVD) is now widely used in many fields. The quality of the diamond film and many factors determine the success of the coating, such as temperature, time, and pressure during coating. The purpose of this study was to produce coated boron-doped diamond (BDD) films by doping boron in the diamond film and to assess them through comparative analysis with foreign acid BDD, which is widely used as a water-treatment electrode in the present industry. The bending of the titanium substrate due to the high temperature during the diamond deposition was avoided by adding an intermediate layer with a columnar structure to niobium film. The filament temperature and pressure were determined through preliminary experiments, and BDD films were coated. The BDD film deposition rate was confirmed to be 100 nm/h, and the potential window increased with increasing thickness. The electrochemical activation and catalytic performance were confirmed according to the surface characteristics. Although the high deposition rate of the BDD coating is also an important factor, it was confirmed that conducting coating so that amorphous carbonization does not occur by controlling the temperature during coating can improve the electrochemical properties of BDD film.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Fuel Cells and Related Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Hydrogen Ship Technology Center, Pusan National University, Busan 46241, Korea
Department of Naval Architecture and Ocean Engineering, Pusan National University, Busan 46241, Korea
Department of Materials Science and Engineering, Pusan National University, Busan 46241, Korea
Funding
National Research Foundation of Korea
References (35)
Show source-provided references
1. The Effect of Oxygen in Diamond Deposition by Microwave Plasma Enhanced Chemical Vapor-Deposition10.1557/JMR.1990.2305 ↗
2. Noble-Gas Studies in Vapor-Growth Diamonds—Comparison with Shock-Produced Diamonds and the Origin of Diamonds in Ureilites10.1016/0016-7037(91)90039-8 ↗
3. Hot Filament Assisted Deposition of Silicon-Nitride Thin-Films10.1063/1.107557 ↗
4. Temperature-Dependence of Growth-Rate for Diamonds Grown Using a Hot-Filament Assisted Chemical-Vapor-Deposition Method at Low Substrate Temperatures10.1063/1.111918 ↗
5. Lattice disorder and texture in diamond coatings deposited by HFCVD on Co-cemented tungsten carbide10.1016/S0040-6090(96)09062-1 ↗
6. Boron doped diamond electrooxidation of 6:2 fluorotelomers and perfluorocarboxylic acids. Application to industrial wastewaters treatment10.1016/j.jelechem.2017.05.033 ↗
7. Electrochemical treatment of artificial humidity condensate by large-scale boron doped diamond electrode10.1016/j.seppur.2014.10.004 ↗
8. Studies on electrochemical treatment of wastewater contaminated with organotin compounds10.1016/j.jhazmat.2007.04.074 ↗
9. Synthesis and Temperature-dependent Electrochemical Properties of Boron-doped Diamond Electrodes on Titanium
10. Electrochemical disinfection of biologically treated wastewater from small treatment systems by using boron-doped diamond (BDD) electrodes - Contribution for direct reuse of domestic wastewater10.1016/j.watres.2009.08.036 ↗
11. Primary biodegradation of ionic liquid cations, identification of degradation products of 1-methyl-3-octylimidazolium chloride and electrochemical wastewater treatment of poorly biodegradable compounds10.1039/B713095C ↗
12. Temperature Simulation and Diamond Deposition Behavior with Distance Between Filament and Susceptor During Hot-Filament Chemical Vapor Deposition10.1166/nnl.2018.2728 ↗
13. Song, C.W., Lee, Y.H., Heo, S.Y., Hwang, N.M., Choi, S., and Kim, K.H. (2018). Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition. Coatings, 8.10.3390/coatings8010015 ↗
14. Titanium’s high-temperature elastic constants through the hcp-bcc phase transformation10.1016/j.actamat.2004.01.002 ↗
15. Zhang, T., and Zou, Y. (2017). The Effect of Deposition Parameters on the Growth Rate of Microcrystalline Diamond Powders Synthesized by HFCVD Method. Coatings, 7.10.3390/coatings7070095 ↗
16. Surface activation pre-treatments for NCD films grown by HFCVD10.1016/j.vacuum.2009.03.014 ↗
17. The diffusion behavior of carbon in sputtered tungsten film and sintered tungsten block and its effect on diamond nucleation and growth10.1016/j.diamond.2014.12.009 ↗
18. Yaws, C.L. (2015). The Yaws Handbook of Vapor Pressure: Antoine Coefficients, Gulf Professional Publishing.
19. Raman spectroscopic investigation of graphitization of diamond during spark plasma sintering of UO2-diamond composite nuclear fuel10.1016/j.jnucmat.2016.03.015 ↗
20. Diamond graphitization by laser-writing for all-carbon detector applications10.1016/j.diamond.2016.12.019 ↗
21. Damage Threshold for Ion-Beam-Induced Graphitization of Diamond10.1063/1.115004 ↗
22. The effect of boron doping on the morphology and growth rate of micron diamond powders synthesized by HFCVD method10.1016/j.diamond.2013.10.008 ↗
23. Boron concentration dependence of Raman spectra on {100} and {111} facets of B-doped CVD diamond10.1016/S0925-9635(98)00296-9 ↗
24. Effect of microwave power and nitrogen addition on the formation of {100} faceted diamond from microcrystalline to nanocrystalline10.1016/j.vacuum.2011.01.024 ↗
25. Crystal growth by charged cluster focused on CVD diamond process10.1016/S0022-0248(98)01034-3 ↗
26. Charged clusters in thin film growth10.1179/095066004225021891 ↗
27. Raman Investigations on Diamond Films and Crystals Deposited by Plasma-Assisted Cvd10.1149/1.2085354 ↗
28. Growth of Diamond Films on Si(100) with and without Boron-Nitride Buffer Layer10.1007/BF02653315 ↗
29. Analysis of heavily boron-doped diamond Raman spectrum10.1016/j.diamond.2018.07.013 ↗
30. The concentration gradient of boron along the growth direction in boron doped chemical vapor deposited diamond10.1016/j.matlet.2015.05.069 ↗
31. Insight into boron-doped diamond Raman spectra characteristic features10.1016/j.carbon.2017.01.022 ↗
32. Preparation of polycrystalline BDD/Ta electrodes for electrochemical oxidation of organic matter10.1016/j.electacta.2018.09.058 ↗
33. Deposition Behavior of Boron-Doped Diamond with Varying Amount of Acetone by Hot Filament Chemical Vapor Deposition10.1007/s13391-019-00152-9 ↗
34. Enhanced electrochemical properties of the DLC films with an arc interlayer, nitrogen doping and annealing10.1016/j.surfcoat.2017.09.025 ↗
35. Synthesis and electrochemical properties of Ti-doped DLC films by a hybrid PVD/PECVD process10.1016/j.apsusc.2017.10.151 ↗