Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)
Source abstract
Abstract
This is a review of current developments in the field of ion-plasma and beam methods of synthesis of protective and functional dielectric coatings. We give rationales for attractiveness and prospects of creating such coatings by electron-beam heating and following evaporation of dielectric targets. Forevacuum plasma electron sources, operating at elevated pressure values from units to hundreds of pascals, make it possible to exert the direct action of an electron beam on low-conductive materials. Electron-beam evaporation of aluminum oxide, boron, and silicon carbide targets is used to exemplify the particular features of electron-beam synthesis of such coatings and their parameters and characteristics.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Ion-surface interactions and analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics, Tomsk State University of Control Systems and Radioelectronics, 634050 Tomsk, Russia
High Current Electronics Institute Russian Academy of Sciences, 634055 Tomsk, Russia
Funding
Russian Science Foundation
References (100+)
Show source-provided references
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