journal article·2019-04-28Open access

Performance Improvement of GaN Based Laser Diode Using Pd/Ni/Au Metallization Ohmic Contact

Wenjie Wang, Wuze Xie, Zejia Deng, Haojun Yang, Mingle Liao, Junze Li, Xiaojia Luo, Song Sun, Degang Zhao

Coatings· Volume 9· Issue 5

Abstract

We report an investigation of the effects of different metal systems and surface treatment on the contact performance of GaN lasers. We found that multi-element metal alloy and surface chemical treatment are the keys to achieve good ohmic behavior contacts on GaN laser diodes. Pd/Ni/Au contact demonstrates excellent thermal stability and lowest specific contact resistivity in these metal systems. Properly adjusting the thickness of the Pd and Ni layer and pretreating with the KOH solution can further improve the ohmic contact performance. The improved ohmic behavior of the KOH solution pretreated Pd/Ni/Au contact is attributed to removing surface oxides and the reduction of the schottky barrier heights due to the metal Pd has a high work function and the interfacial reactions occurring between the Pd, Ni, Au, and GaN extends into the GaN film. As a result, a low contact resistivity of 1.66 × 10−5 Ω·cm2 can be achieved from Pd(10 nm)/Ni(10 nm)/Au(30 nm) contacts with KOH solution pretreated on top of the laser diode structure. The power of the GaN based laser diode with the Pd/Ni/Au metallization ohmic contact can be enhanced by 1.95 times and the threshold current decreased by 37% compared to that of the conventional ohmic contact Ni/Au.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Microsystem & Terahertz Research Center, China Academy of Engineering Physics, Chengdu 610200, China

Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621999, China

State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China

Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

Funding

Science Challenge Project · National Natural Science Foundation of China · National Key R&D Program of China

References (52)

Show source-provided references
1. InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate10.1063/1.120688 ↗
2. Demonstration of nonpolar m-plane InGaN/GaN laser diodes10.1143/JJAP.46.L190 ↗
3. 450-nm GaN laser diode enables high-speed visible light communication with 9-Gbps QAM-OFDM10.1364/OE.23.013051 ↗
4. High-power GaN pn junction blue-light-emitting diodes10.1143/JJAP.30.L1998 ↗
5. Ultraviolet and violet GaN light emitting diodes on silicon10.1063/1.120775 ↗
6. Candela class high brightness InGaN/AlGaN double heterostructure blue light emitting diodes10.1063/1.111832 ↗
7. Silver free III-nitride flip chip light-emitting-diode with wall plug efficiency over 70% utilizing a GaN tunnel junction10.1063/1.4967501 ↗
8. Very-high power density AlGaN/GaN HEMTs10.1109/16.906455 ↗
9. Vertical power pn diodes based on bulk GaN10.1109/TED.2014.2360861 ↗
10. GaN and InGaN metal-semiconductor-metal photodetectors with different Schottky contact metals10.1143/JJAP.40.2996 ↗
11. Visible-blind ultraviolet photodetectors based on GaN pn junctions10.1049/el:19951190 ↗
12. Monolithically integrated InGaN/GaN light-emitting diodes, photodetectors, and waveguides on Si substrate10.1364/OPTICA.5.000564 ↗
13. MBE growth and doping of III–V nitrides10.1016/S0022-0248(98)00291-7 ↗
14. Comparison of Ni/Au, Pd/Au, Cr/Au metallizations for ohmic contacts to p-GaN10.1557/PROC-449-1091 ↗
15. Improved thermally stable ohmic contacts on p-GaN based on W2B10.1063/1.2161806 ↗
16. Investigation of indium–tin-oxide ohmic contact to p-GaN and its application to high-brightness GaN-based light-emitting diodes10.1016/j.sse.2005.04.001 ↗
17. Microstructural investigation of oxidized Ni/Au ohmic contact to p-type GaN10.1063/1.371294 ↗
18. Oxidized Ni/Pt and Ni/Au ohmic contacts to p-type GaN10.1063/1.126755 ↗
19. Low resistance nonalloyed Ni/Au Ohmic contacts to p-GaN irradiated by KrF excimer laser10.1063/1.2236656 ↗
20. Low resistance Ti/Pt/Au ohmic contacts to p-type GaN10.1063/1.126674 ↗
21. Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment10.1063/1.122641 ↗
22. Low-resistance nonalloyed ohmic contact to p-type GaN using strained InGaN contact layer10.1063/1.1410336 ↗
23. Metallization scheme for highly low-resistance, transparent, and thermally stable ohmic contacts to p-GaN10.1063/1.126510 ↗
24. Temperature-dependent contact resistivity of the nonalloyed ohmic contacts to p-GaN10.1063/1.1691178 ↗
25. Carrier transport mechanism of Pd/Pt/Au ohmic contacts to p-GaN in InGaN laser diode10.1002/1521-396X(200212)194:2<587::AID-PSSA587>3.0.CO;2-O ↗
26. Low-resistance ohmic contacts on p-type GaN using Ni/Pd/Au metallization10.1063/1.1327276 ↗
27. Al-free cladding-layer blue laser diodes with a low aspect ratio in far-field beam pattern10.1088/1674-4926/39/8/084004 ↗
28. 444.9 nm semipolar (1122) laser diode grown on an intentionally stress relaxed InGaN waveguiding layer10.1063/1.3675850 ↗
29. On-chip integration of gan-based laser, modulator, and photodetector grown on Si
30. Effects of surface treatments and metal work functions on electrical properties at p-GaN/metal interfaces10.1063/1.363912 ↗
31. Effect of surface treatment by KOH solution on ohmic contact formation of p-type GaN10.1016/S0038-1101(98)00265-2 ↗
32. Ohmic contact formation mechanism of nonalloyed Pd contacts to p-type GaN observed by positron annihilation spectroscopy10.1063/1.123827 ↗
33. High-quality nonalloyed rhodium-based ohmic contacts to p-type GaN10.1063/1.1613991 ↗
34. p-GaN surface treatments for metal contacts10.1063/1.125772 ↗
35. GaN: Processing, defects, and devices10.1063/1.371145 ↗
36. Ohmic contact formation mechanism of Pd nonalloyed contacts on p-type GaN
37. Investigation of oxidation mechanism for ohmic formation in Ni/Au contacts to p-type GaN layers10.1063/1.1425065 ↗
38. Analysis of localization effect in blue-violet light emitting InGaN/GaN multiple quantum wells with different well widths10.1088/1674-1056/26/1/017805 ↗
39. Investigation of low-resistance metal contacts on p-type GaN using the linear and circular transmission line method10.1002/1521-396X(200101)183:1<169::AID-PSSA169>3.0.CO;2-D ↗
40. The effects of contact size and non-zero metal resistance on the determination of specific contact resistance10.1016/0038-1101(82)90036-3 ↗
41. Characterization of Pd/Ni/Au ohmic contacts on p-GaN10.1016/j.sse.2005.01.020 ↗
42. Low-resistance Pt/Ni/Au ohmic contacts to p-type GaN10.1063/1.123954 ↗
43. Low-resistance and thermally stable ohmic contact on p-type GaN using Pd/Ni metallization10.1063/1.1403660 ↗
44. Interfacial reaction of Ni/Pt/Au contact schemes to p-type GaN10.1149/1.1392490 ↗
45. Formation of high-quality Ag-based ohmic contacts to p-type GaN10.1149/1.2940324 ↗
46. The role of Ni and Au on transparent film of blue LEDs10.1016/S0038-1101(03)00112-6 ↗
47. Demonstration of a III-nitride edge-emitting laser diode utilizing a GaN tunnel junction contact10.1364/OE.24.007816 ↗
48. Semipolar III-nitride laser diodes with zinc oxide cladding10.1364/OE.25.016922 ↗
49. Evidence for the passivation effect in (NH4)2Sx-treated GaAs observed by slow positrons10.1063/1.104353 ↗
50. Electrical characterization and metallurgical analysis of Pd-containing multilayer contacts on GaN10.1063/1.1383977 ↗
51. Role of annealing conditions and surface treatment on ohmic contacts to p-GaN and p-Al0.1Ga0.9N/GaN superlattices10.1063/1.1423387 ↗
52. Heteroepitaxial thermal gradient solution growth of GaN10.1149/1.2404088 ↗