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1. InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate
10.1063/1.120688 ↗3. 450-nm GaN laser diode enables high-speed visible light communication with 9-Gbps QAM-OFDM
10.1364/OE.23.013051 ↗6. Candela class high brightness InGaN/AlGaN double heterostructure blue light emitting diodes
10.1063/1.111832 ↗7. Silver free III-nitride flip chip light-emitting-diode with wall plug efficiency over 70% utilizing a GaN tunnel junction
10.1063/1.4967501 ↗10. GaN and InGaN metal-semiconductor-metal photodetectors with different Schottky contact metals
10.1143/JJAP.40.2996 ↗12. Monolithically integrated InGaN/GaN light-emitting diodes, photodetectors, and waveguides on Si substrate
10.1364/OPTICA.5.000564 ↗16. Investigation of indium–tin-oxide ohmic contact to p-GaN and its application to high-brightness GaN-based light-emitting diodes
10.1016/j.sse.2005.04.001 ↗17. Microstructural investigation of oxidized Ni/Au ohmic contact to p-type GaN
10.1063/1.371294 ↗19. Low resistance nonalloyed Ni/Au Ohmic contacts to p-GaN irradiated by KrF excimer laser
10.1063/1.2236656 ↗21. Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment
10.1063/1.122641 ↗22. Low-resistance nonalloyed ohmic contact to p-type GaN using strained InGaN contact layer
10.1063/1.1410336 ↗23. Metallization scheme for highly low-resistance, transparent, and thermally stable ohmic contacts to p-GaN
10.1063/1.126510 ↗24. Temperature-dependent contact resistivity of the nonalloyed ohmic contacts to p-GaN
10.1063/1.1691178 ↗26. Low-resistance ohmic contacts on p-type GaN using Ni/Pd/Au metallization
10.1063/1.1327276 ↗28. 444.9 nm semipolar (1122) laser diode grown on an intentionally stress relaxed InGaN waveguiding layer
10.1063/1.3675850 ↗29. On-chip integration of gan-based laser, modulator, and photodetector grown on Si
30. Effects of surface treatments and metal work functions on electrical properties at p-GaN/metal interfaces
10.1063/1.363912 ↗32. Ohmic contact formation mechanism of nonalloyed Pd contacts to p-type GaN observed by positron annihilation spectroscopy
10.1063/1.123827 ↗36. Ohmic contact formation mechanism of Pd nonalloyed contacts on p-type GaN
37. Investigation of oxidation mechanism for ohmic formation in Ni/Au contacts to p-type GaN layers
10.1063/1.1425065 ↗38. Analysis of localization effect in blue-violet light emitting InGaN/GaN multiple quantum wells with different well widths
10.1088/1674-1056/26/1/017805 ↗43. Low-resistance and thermally stable ohmic contact on p-type GaN using Pd/Ni metallization
10.1063/1.1403660 ↗47. Demonstration of a III-nitride edge-emitting laser diode utilizing a GaN tunnel junction contact
10.1364/OE.24.007816 ↗49. Evidence for the passivation effect in (NH4)2Sx-treated GaAs observed by slow positrons
10.1063/1.104353 ↗50. Electrical characterization and metallurgical analysis of Pd-containing multilayer contacts on GaN
10.1063/1.1383977 ↗51. Role of annealing conditions and surface treatment on ohmic contacts to p-GaN and p-Al0.1Ga0.9N/GaN superlattices
10.1063/1.1423387 ↗