Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor
Source abstract
Abstract
The deposition of protective coatings on aluminised polymer substrates by a plasma enhanced chemical vapour deposition PECVD technique in a plasma reactor with a volume of 5 m3 was studied. HMDSO was used as a precursor. Plasma was sustained in a capacitively coupled radiofrequency (RF) discharge powered by an RF generator operating at 40 kHz and having an adjustable output power up to 8 kW. Gaseous plasma was characterised by residual gas mass spectrometry and optical emission spectroscopy. Polymer samples with an average roughness of approximately 5 nm were mounted into the plasma reactor and subjected to a protocol for activation, metallisation and deposition of the protective coating. After depositing the protective coating, the samples were characterised by secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS). The combination of various techniques for plasma and coating characterisation provided insight into the complex gas-phase and surface reactions upon deposition of the protective coatings in the industrial-size plasma reactor.
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Research context
OpenAlex topics: Surface Modification and Superhydrophobicity · Metal and Thin Film Mechanics · Plasma Diagnostics and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Elvez Ltd, Ulica Antona Tomšiča 35, 1294 Višnja Gora, Slovenia
Ecotechnologies, Jozef Stefan International Postgraduate School, Jamova cesta 39, 1000 Ljubljana, Slovenia
Department of Surface Engineering, Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
Plasmadis Ltd, Teslova ulica 30, 1000 Ljubljana, Slovenia
Funding
Javna Agencija za Raziskovalno Dejavnost RS
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